SCHEMBL3853218

SCHEMBL3853218

CC(c1ccco1)N(C)C

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.53
KMT2A Q03164 4/20 0.39
POLB P06746 3/20 0.39
PKM P14618 1/20 0.39
PTPN1 P18031 1/20 0.39
PTPN7 P35236 1/20 0.39
BLM P54132 1/20 0.39
ESR2 Q92731 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
TSHR P16473 1/20 0.39
TP53 P04637 1/20 0.39
OPRM1 P35372 2/20 0.38
OPRK1 P41145 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 2/20 0.37
MEN1 O00255 1/20 0.37
MAPT P10636 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
OPRD1 P41143 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18878201 0.76 ALOX5 (0.45) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL9918374 0.74 OPRM1 (0.46) ALOX5KMT2APOLBOPRM1SMN1; SMN2
SCHEMBL7098541 0.74 TP53 (0.46) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL80874 0.74
SCHEMBL31584726 0.71 ALOX5 (0.41) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL9923033 0.71 OPRM1 (0.47) KMT2APOLBOPRM1SMN1; SMN2ALDH1A1
SCHEMBL22838158 0.70 ALOX5 (0.44) ALOX5KMT2APOLBPKMPTPN1
SCHEMBL8806794 0.70 ALOX5 (1.00) ALOX5
SCHEMBL942463 0.70
SCHEMBL919847 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1810323-B1 COMPOSITIONS AND PROCESSES FOR PHOTORESIST STRIPPING AND RESIDUE REMOVAL IN WAFER LEVEL PACKAGING EKC TECHNOLOGY INC (US) 2009-12-09 EP disclosed
US-7579308-B2 Compositions and processes for photoresist stripping and residue removal in wafer level packaging EKC/DUPONT ELECTRONICS TECHNOLOGIES (US) 2009-08-25 US disclosed
US-7543592-B2 Compositions and processes for photoresist stripping and residue removal in wafer level packaging EKC TECHNOLOGY, INC. (US) 2009-06-09 US disclosed
EP-1810323-A1 COMPOSITIONS AND PROCESSES FOR PHOTORESIST STRIPPING AND RESIDUE REMOVAL IN WAFER LEVEL PACKAGING EKC TECHNOLOGY, INC. (US) 2007-07-25 EP disclosed
US-20060115970-A1 Compositions and processes for photoresist stripping and residue removal in wafer level packaging EKC TECHNOLOGY, INC. 2006-06-01 US disclosed
WO-2006050323-A1 COMPOSITIONS AND PROCESSES FOR PHOTORESIST STRIPPING AND RESIDUE REMOVAL IN WAFER LEVEL PACKAGING EKC TECHNOLOGY, INC. (US) 2006-05-11 WO disclosed
US-20060094613-A1 Compositions and processes for photoresist stripping and residue removal in wafer level packaging LEE WAI M 2006-05-04 US disclosed
US-20050263743-A1 Compositions and processes for photoresist stripping and residue removal in wafer level packaging EKC TECHNOLOGY, INC. 2005-12-01 US disclosed