SCHEMBL3854552

SCHEMBL3854552

C=CCC(C)(CCN)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28280747 0.74
SCHEMBL2046739 0.72
SCHEMBL16068292 0.72
Iodide SCHEMBL14836938 0.70 ALDH1A1 (0.32)
SCHEMBL28154166 0.68
SCHEMBL14330211 0.68 ALOX15 (0.35)
SCHEMBL17565592 0.67 ALDH1A1 (0.31)
SCHEMBL2301981 0.67
SCHEMBL14755897 0.67 ALDH1A1 (0.31)
SCHEMBL28404915 0.66 MMP1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7585570-B2 A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-09-08 US disclosed
US-20060252863-A1 A curable adhesive comprising acrylic ester polymers, a polysilsesquioxane or polysilicate, and a disisocyanate crosslinking agent; liquid crystal displays; glass substrates; films; durability; antipeeling agents; haze-free, nonblistering; antifoam agents; resistant to repeated cycles of heating/cooling SUMITOMO CHEMICHAL COMPANY, LIMITED 2006-11-09 US disclosed
US-4268602-A Photosensitive O-quinone diazide containing composition TORAY INDUSTRIES, LTD. (JP) 1981-05-19 US disclosed