Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A1 | P04798 | 1/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.51 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.51 |
| ▸ | TUBB1 | Q9H4B7 | 15/20 | 0.51 |
| ▸ | TUBB4A | P04350 | 11/20 | 0.51 |
| ▸ | TUBB | P07437 | 11/20 | 0.51 |
| ▸ | TUBA3C | P0DPH7 | 11/20 | 0.51 |
| ▸ | TUBA1B | P68363 | 11/20 | 0.51 |
| ▸ | TUBA4A | P68366 | 11/20 | 0.51 |
| ▸ | TUBB4B | P68371 | 11/20 | 0.51 |
| ▸ | TUBB3 | Q13509 | 11/20 | 0.51 |
| ▸ | TUBB2A | Q13885 | 11/20 | 0.51 |
| ▸ | TUBB8 | Q3ZCM7 | 11/20 | 0.51 |
| ▸ | TUBA3E | Q6PEY2 | 11/20 | 0.51 |
| ▸ | TUBA1A | Q71U36 | 11/20 | 0.51 |
| ▸ | TUBA1C | Q9BQE3 | 11/20 | 0.51 |
| ▸ | TUBB6 | Q9BUF5 | 11/20 | 0.51 |
| ▸ | TUBB2B | Q9BVA1 | 11/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3855061 | 1.00 | CYP1A1 (0.51) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL147174 | 0.88 | CYP1A1 (0.51) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL147173 | 0.88 | CYP1A1 (0.51) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL7803314 | 0.86 | TUBB4A (0.60) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL7803315 | 0.86 | TUBB4A (0.60) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL4608533 | 0.77 | CYP1A1 (0.79) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL4608535 | 0.77 | CYP1A1 (0.79) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL1048204 | 0.74 | CYP1A2 (0.51) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL1048205 | 0.74 | CYP1A2 (0.51) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A | |
| SCHEMBL27852286 | 0.73 | TUBB1 (0.61) | CYP1A1CYP1A2CYP1B1TUBB1TUBB4A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| US-7582412-B2 | Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-7390608-B2 | Photoresists containing Si-polymers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-06-24 | — | — | US | disclosed |
| US-7306892-B2 | Multilayer photoresist system | SHIPLEY COMPANY, L.L.C. (US) | 2007-12-11 | — | — | US | disclosed |
| EP-1319197-B1 | ANTIREFLECTIVE COMPOSITION | SHIPLEY CO LLC (US) | 2007-06-06 | — | — | EP | disclosed |
| US-7217490-B2 | Processes for producing silane monomers and polymers and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2007-05-15 | — | — | US | disclosed |
| US-7118847-B2 | Polymer and photoresist compositions | SHIPLEY COMPANY LLC (US) | 2006-10-10 | — | — | US | disclosed |
| US-7008750-B2 | Processes for producing polysiloxanes and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2006-03-07 | — | — | US | disclosed |
| EP-1251155-B1 | Method of forming optical waveguides using a photodefinable silsesquioxane composition | SHIPLEY CO LLC (US) | 2006-01-11 | — | — | EP | disclosed |
| US-6110641-A | Radiation sensitive composition containing novel dye | SHIPLEY COMPANY, L.L.C. (US) | 2000-08-29 | — | — | US | disclosed |
| US-5910394-A | RADIATION SENSITIVE CURED COATING WHICH EXHIBITS SUBSTANTIAL FLEXIBILITY AND REDUCES LINE GROWTH | SHIPLEY COMPANY, L.L.C. (US) | 1999-06-08 | — | — | US | disclosed |
| US-5866299-A | BLEND OF ALKALI SOLUBLE RESIN AND PHOTOACID GENERATING COMPOUND | SHIPLEY COMPANY, L.L.C. (US) | 1999-02-02 | — | — | US | disclosed |
| EP-0621509-B1 | Use of a radiation sensitive composition in the production of a liquid crystal display device | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-28 | — | — | EP | disclosed |
| US-5609988-A | NEGATIVE RESIST, NOVOLAK, METHYLOL OR METHOXYMETHYL CURING AGENT, 2-BENZODIOXOLYL-4,6-BIS(TRICHLOROMETHYL)TRIAZINE ACID GENERATING AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | disclosed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| EP-0621509-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |