SCHEMBL147174

SCHEMBL147174

COc1cc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc(OC)c1OC

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A1 P04798 1/20 0.51
CYP1A2 P05177 1/20 0.51
CYP1B1 Q16678 1/20 0.51
TUBB1 Q9H4B7 15/20 0.50
TUBB4A P04350 12/20 0.50
TUBB P07437 12/20 0.50
TUBA3C P0DPH7 12/20 0.50
TUBA1B P68363 12/20 0.50
TUBA4A P68366 12/20 0.50
TUBB4B P68371 12/20 0.50
TUBB3 Q13509 12/20 0.50
TUBB2A Q13885 12/20 0.50
TUBB8 Q3ZCM7 12/20 0.50
TUBA3E Q6PEY2 12/20 0.50
TUBA1A Q71U36 12/20 0.50
TUBA1C Q9BQE3 12/20 0.50
TUBB6 Q9BUF5 12/20 0.50
TUBB2B Q9BVA1 12/20 0.50
MEN1 O00255 1/20 0.49
LMNA P02545 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL147173 1.00 CYP1A1 (0.51) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL3855064 0.88 CYP1A1 (0.51) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL3855061 0.88 CYP1A1 (0.51) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL7803315 0.86 TUBB4A (0.60) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL7803314 0.86 TUBB4A (0.60) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL21940413 0.85 MAPT (0.53) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL29417481 0.85 MAPT (0.53) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL151090 0.85 MAPT (0.53) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL151091 0.85 MAPT (0.53) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A
SCHEMBL29363338 0.85 MAPT (0.53) CYP1A1CYP1A2CYP1B1TUBB1TUBB4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 503 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
CN-115368494-B Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof 瑞红(苏州)电子化学品股份有限公司 2024-03-29 CN claimed
EP-0621508-B1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-09-25 EP claimed
US-5494777-A Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-02-27 US claimed
EP-0621508-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-10-26 EP claimed
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP claimed
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN disclosed
US-12622847-B2 Organosilicon compound and dental composition containing same KURARAY NORITAKE DENTAL INC. (JP) 2026-05-12 US disclosed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN disclosed
US-20260060900-A1 DENTAL COMPOSITE RESIN KIT SHOFU INC. (JP) 2026-03-05 US disclosed
US-12478562-B2 Dental restoration material composition KURARAY NORITAKE DENTAL INC. (JP) 2025-11-25 US disclosed
US-12465559-B2 Fluorescent curable dental composition and cured product thereof KURARAY NORITAKE DENTAL INC. (JP) 2025-11-11 US disclosed
EP-0621508-B1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-09-25 EP disclosed
EP-0704765-A1 A photoresist composition comprising a polyfunctional vinyl ether compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-04-03 EP disclosed
US-5494777-A Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-02-27 US disclosed
US-5432039-A Radiation sensitive quinone diazide and resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-07-11 US disclosed
EP-0621509-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-10-26 EP disclosed
EP-0621508-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-10-26 EP disclosed
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260060900-A1 DENTAL COMPOSITE RESIN KIT BOLA2; BOLA2B, LBR, COL2A1 CYP1A1 4225/4885CYP1A2 4222/4885CYP1B1 3283/4885
US-12465559-B2 Fluorescent curable dental composition and cured product thereof BRD1, TBCA, BAZ1A CYP1A1 3395/4885CYP1A2 3884/4885CYP1B1 3191/4885
US-12478562-B2 Dental restoration material composition CAD, MAT2B, RER1 CYP1A1 340/4885CYP1A2 634/4885CYP1B1 204/4885
US-12622847-B2 Organosilicon compound and dental composition containing same MSL1, ITGA1, ITGAL CYP1A1 403/4885CYP1A2 1386/4885CYP1B1 1024/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.