Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.51 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.51 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.51 |
| ▸ | RAB9A | P51151 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
| ▸ | RELA | Q04206 | 2/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.50 |
| ▸ | CYP1A1 | P04798 | 3/20 | 0.49 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.49 |
| ▸ | ESR1 | P03372 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.49 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.49 |
| ▸ | TUBB | P07437 | 2/20 | 0.49 |
| ▸ | TUBA3C | P0DPH7 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1048204 | 1.00 | CYP1A2 (0.51) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL8852597 | 0.91 | MAPT (0.56) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL51497 | 0.85 | CYP1A2 (0.50) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL51498 | 0.85 | CYP1A2 (0.50) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL21940412 | 0.85 | CYP1A2 (0.50) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| Hydrogen Sulfide SCHEMBL30503988 | 0.84 | CYP1A2 (0.49) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL24897242 | 0.84 | CYP1A2 (0.64) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL7803315 | 0.83 | TUBB4A (0.60) | CYP1A2CYP1A1CYP1B1TUBB4ATUBB | |
| SCHEMBL7803314 | 0.83 | TUBB4A (0.60) | CYP1A2CYP1A1CYP1B1TUBB4ATUBB | |
| SCHEMBL7160271 | 0.78 | ADORA3 (0.48) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| US-11746255-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS LTD (GB) | 2023-09-05 | — | — | US | disclosed |
| CN-109562944-B | Hard mask composition | 亚历克斯·菲利普·格雷厄姆·罗宾逊 | 2022-09-09 | — | — | CN | disclosed |
| CN-112119133-B | Hard mask composition | 亚历克斯·P·G·罗宾逊 | 2022-05-24 | — | — | CN | disclosed |
| US-10438808-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS, LTD (GB) | 2019-10-08 | — | — | US | disclosed |
| US-10290500-B2 | Spin on hard mask material | IRRESISTIBLE MATERIALS LTD (GB) | 2019-05-14 | — | — | US | disclosed |
| US-20190127604-A1 | HARD-MASK COMPOSITION | NANO-C, INC. | 2019-05-02 | — | — | US | disclosed |
| WO-2017205272-A1 | HARD-MASK COMPOSITION | R0BINSON ALEX PHILIP GRAHAM (GB) | 2017-11-30 | — | — | WO | disclosed |
| US-20170345669-A1 | HARD-MASK COMPOSITION | NANO-C, INC. | 2017-11-30 | — | — | US | disclosed |
| EP-0621509-B1 | Use of a radiation sensitive composition in the production of a liquid crystal display device | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-28 | — | — | EP | disclosed |
| US-5631307-A | SULFONIUM ORGANOBORON COMPLEX OR OXOSULFONIUM ORGANOBORON COMPLEX WITH SENSITIZERS | TOYO INK MANUFACTURING CO., LTD. (JP) | 1997-05-20 | — | — | US | disclosed |
| US-5609988-A | NEGATIVE RESIST, NOVOLAK, METHYLOL OR METHOXYMETHYL CURING AGENT, 2-BENZODIOXOLYL-4,6-BIS(TRICHLOROMETHYL)TRIAZINE ACID GENERATING AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | disclosed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| EP-0690074-A1 | Photopolymerization initiator composition and photopolymerizable composition | TOYO INK MANUFACTURING CO., LTD. (JP) | 1996-01-03 | — | — | EP | disclosed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0621509-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0458325-A1 | Negative photosensitive composition and method for forming a resist pattern | Mitsubishi Chemical Corporation (JP) | 1991-11-27 | — | — | EP | disclosed |