SCHEMBL3860255

SCHEMBL3860255

c1ccc(-c2ccc3nc[nH]c3c2-c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA3 P0DMS8 3/20 0.46
ADORA2A P29274 3/20 0.46
ADORA1 P30542 3/20 0.46
DPP4 P27487 1/20 0.40
MAPT P10636 2/20 0.39
CYP3A4 P08684 2/20 0.39
KDM4E B2RXH2 2/20 0.39
QPCT Q16769 2/20 0.37
QPCTL Q9NXS2 2/20 0.37
SMN1; SMN2 Q16637 4/20 0.36
RAB9A P51151 3/20 0.36
NPC1 O15118 2/20 0.36
PDPK1 O15530 2/20 0.36
LMNA P02545 1/20 0.36
SRC P12931 1/20 0.35
MAPK1 P28482 1/20 0.35
CA12 O43570 1/20 0.34
PARP1 P09874 1/20 0.34
ALOX15 P16050 1/20 0.34
CA9 Q16790 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7567751 0.78 ADORA3 (0.49) ADORA3ADORA2AADORA1DPP4MAPT
SCHEMBL8275928 0.77 ALDH1A1 (0.43) ADORA3ADORA2AADORA1DPP4MAPT
SCHEMBL3149686 0.77 DPP4 (0.60) ADORA3ADORA2AADORA1DPP4MAPT
SCHEMBL9718690 0.76 MAPK14 (0.38) ADORA3ADORA2AADORA1MAPTCYP3A4
SCHEMBL3860252 0.71 DPP4 (0.62) ADORA3ADORA2AADORA1DPP4MAPT
SCHEMBL1374558 0.71 PRKCI (0.44) MAPTCYP3A4KDM4ESMN1; SMN2RAB9A
SCHEMBL8121272 0.70 PARP1 (0.37) SMN1; SMN2PDPK1CA12PARP1ALOX15
SCHEMBL29070667 0.70 NPC1 (0.49) ADORA3ADORA2AADORA1MAPTCYP3A4
SCHEMBL7090029 0.69 ADORA2A (0.51) ADORA3ADORA2AADORA1DPP4MAPT
SCHEMBL8889421 0.69 ADORA1 (0.51) ADORA3ADORA2AADORA1DPP4MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7579134-B2 cover layer comprises polyamic acid precursor curable to an adhesive polyimide base polymer and an ethylenically unsaturated photo-monomer; avoiding unwanted curling of a flexible printed circuit E. I. DUPONT DE NEMOURS AND COMPANY (US) 2009-08-25 US claimed
US-20060210819-A1 Polyimide composite coverlays and methods and compositions relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-09-21 US claimed
US-20090292038-A1 Flame Retardant Photoimagable Coverlay Compositions and Methods Relating thereto E. I. DU PONT DE NEMOURS AND COMPANY 2009-11-26 US disclosed
US-7618766-B2 Flame retardant photoimagable coverlay compositions and methods relating thereto E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-11-17 US disclosed
US-7579134-B2 cover layer comprises polyamic acid precursor curable to an adhesive polyimide base polymer and an ethylenically unsaturated photo-monomer; avoiding unwanted curling of a flexible printed circuit E. I. DUPONT DE NEMOURS AND COMPANY (US) 2009-08-25 US disclosed
US-7527915-B2 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-05-05 US disclosed
US-20080033090-A1 Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2008-02-07 US disclosed
WO-2007073498-A2 FLAME RETARDANT PHOTOIMAGABLE COVERLAY COMPOSITIONS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-06-28 WO disclosed
US-20070149635-A1 Flame retardant photoimagable coverlay compositions and methods relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2007-06-28 US disclosed
US-20060210819-A1 Polyimide composite coverlays and methods and compositions relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-09-21 US disclosed
US-20040058276-A1 Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto E. I. DU PONT DE NEMOURS AND COMPANY 2004-03-25 US disclosed
EP-1400545-A2 Halo resistant photoimagable coverlay compositions E.I. DU PONT DE NEMOURS AND COMPANY (US) 2004-03-24 EP disclosed
US-6228919-B1 Solvent dispersible interpenetrating polymer networks E. I. DU PONT DE NEMOURS AND COMPANY 2001-05-08 US disclosed
US-5985998-A POLYMERS AND CROSSLINKING IN SOLVENTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1999-11-16 US disclosed
US-5886101-A TWO INTERPENETRATING CROSSLINKED POLYMERS, AT LEAST ONE OF WHICH IS FORMED BY SOLVENT POLYMERIZATION; PHOTOSENSITIVE BINDERS OR SOLDER MASKS; PHOTORESISTS; PROTECTIVE AND DECORATIVE COATINGS; TOUGHNESS; FLEXIBILITY E. I. DU PONT DE NEMOURS AND COMPANY (US) 1999-03-23 US disclosed
EP-0501433-B1 Photosensitive compositions using solvent dispersible interpenetrating polymer networks DU PONT (US) 1997-05-07 EP disclosed
EP-0573609-A1 PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-12-15 EP disclosed
WO-1992015628-A1 PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-17 WO disclosed
EP-0501433-A1 Solvent dispersible interpenetrating polymer networks E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-02 EP disclosed