SCHEMBL3860604

SCHEMBL3860604

Cc1c(OCC(O)CN(C)C)cc2c(=O)c3ccccc3sc2c1C

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HCRTR1 O43613 1/20 0.44
ALDH1A1 P00352 1/20 0.44
LMNA P02545 1/20 0.44
POLB P06746 1/20 0.44
MAPT P10636 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
HIF1A Q16665 1/20 0.41
HTR1A P08908 2/20 0.40
ABCB1 P08183 2/20 0.40
HPGD P15428 1/20 0.39
CSF1R P07333 1/20 0.39
CYP2D6 P10635 3/20 0.38
HTR2A P28223 2/20 0.38
NSD2 O96028 1/20 0.37
RAD52 P43351 1/20 0.37
CDK4 P11802 1/20 0.37
ADRB2 P07550 1/20 0.37
ADRB1 P08588 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29566503 1.00 HCRTR1 (0.44) HCRTR1ALDH1A1LMNAPOLBMAPT
Chloromethane SCHEMBL1132739 0.98 HCRTR1 (0.42) HCRTR1ALDH1A1LMNAPOLBMAPT
Trimethylammonium SCHEMBL3407456 0.91 MAPT (0.43) HCRTR1ALDH1A1LMNAPOLBMAPT
SCHEMBL12224171 0.88 MAPT (0.46) HCRTR1ALDH1A1LMNAPOLBMAPT
SCHEMBL821151 0.87 MAPT (0.45) HCRTR1ALDH1A1LMNAPOLBMAPT
Hydrochloric Acid SCHEMBL476928 0.86 MAPT (0.44) HCRTR1ALDH1A1LMNAPOLBMAPT
Hydrochloric Acid SCHEMBL29378499 0.86 MAPT (0.44) HCRTR1ALDH1A1LMNAPOLBMAPT
Hydrochloric Acid SCHEMBL29488522 0.86 MAPT (0.44) HCRTR1ALDH1A1LMNAPOLBMAPT
Hydrochloric Acid SCHEMBL15380794 0.86 MAPT (0.44) HCRTR1ALDH1A1LMNAPOLBMAPT
SCHEMBL22809830 0.85 ALOX15 (0.45) HCRTR1ALDH1A1LMNAPOLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2082994-A1 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs Samsung SDI Co., Ltd. (KR) 2009-07-29 EP disclosed
CN-100500720-C Process for producing water-soluble polymer TOAGOSEI CO LTD (JP) 2009-06-17 CN disclosed
CN-1890279-A Process for producing water-soluble polymer TOAGOSEI CO LTD (JP) 2007-01-03 CN disclosed