Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.50 |
| ▸ | LCK | P06239 | 3/20 | 0.41 |
| ▸ | TTR | P02766 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | ALB | P02768 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9149322 | 0.84 | PTGS1 (0.38) | CYP3A4TSHRTDP1TRPA1TTR | |
| SCHEMBL19655038 | 0.84 | TRPA1 (0.38) | CYP3A4TSHRTDP1TRPA1LCK | |
| SCHEMBL8089211 | 0.78 | TRPA1 (0.74) | CYP3A4TSHRTDP1TRPA1LCK | |
| SCHEMBL8089207 | 0.78 | TRPA1 (0.74) | CYP3A4TSHRTDP1TRPA1LCK | |
| SCHEMBL5613166 | 0.78 | APEX1 (0.45) | TSHRTDP1ALDH1A1CA1CA2 | |
| SCHEMBL12004083 | 0.74 | TP53 (0.39) | TSHRTDP1ALDH1A1 | |
| SCHEMBL373244 | 0.74 | ERN1 (0.52) | CYP3A4TSHRTDP1TRPA1LCK | |
| SCHEMBL31380876 | 0.73 | TRPA1 (0.52) | TRPA1LCKMEN1KMT2AALDH1A1 | |
| SCHEMBL2885475 | 0.73 | TRPA1 (0.52) | TRPA1LCKMEN1KMT2AALDH1A1 | |
| SCHEMBL665222 | 0.72 | ALDH1A1 (0.44) | CYP3A4TSHRTDP1TRPA1LCK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2016464-B1 | NEGATIVE PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2021-04-28 | — | — | EP | claimed |
| US-7601482-B2 | Negative photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | claimed |
| EP-2016464-A2 | NEGATIVE PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2009-01-21 | — | — | EP | claimed |
| WO-2007110773-A2 | NEGATIVE PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-10-04 | — | — | WO | claimed |
| US-20070231735-A1 | Negative photoresist compositions | MERCK PATENT GMBH (DE) | 2007-10-04 | — | — | US | claimed |
| EP-4702010-A1 | PHOTOACTIVE COMPOUNDS | Merck Patent GmbH (DE) | 2026-03-04 | — | — | EP | disclosed |
| WO-2024223739-A1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2024-10-31 | — | — | WO | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| CN-108139670-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2021-07-09 | — | — | CN | disclosed |
| EP-2016464-B1 | NEGATIVE PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2021-04-28 | — | — | EP | disclosed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | disclosed |
| EP-3394674-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-05-06 | — | — | EP | disclosed |
| EP-0353339-A2 | A process for the production of poly(3-mono or 3,5-disubstituted-4-Acetoxystryrenes), their copolymers and hydrolysis thereof | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-02-07 | — | — | EP | disclosed |
| US-4868257-A | Process for the production of 3-mono or 3,5 disubstituted-4-acetoxystyrene, its polymerization | HOECHST CELANESE CORPORATION (US) | 1989-09-19 | — | — | US | disclosed |
| US-4868256-A | Process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene its polymerization, and hydrolysis | HOECHST CELANESE (US) | 1989-09-19 | — | — | US | disclosed |
| EP-0307752-A2 | Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-03-22 | — | — | EP | disclosed |
| EP-0307751-A2 | 3-mono- and 3,5-disubstituted-4-acetoxy and -4-hydroxystyrenes and process for their production | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-03-22 | — | — | EP | disclosed |
| EP-0082355-A2 | Semipermeable membranes of modified polystyrene, process for their manufacture and their use | ALIGENA AG (CH) | 1983-06-29 | — | — | EP | disclosed |
| US-4075237-A | Perfluorinated esters of fumaric acid and certain other ethylenically unsaturated poly-basic acid and soil repellant polymers thereof | GEIGY CHEMICAL CORPORATION (US) | 1978-02-21 | — | — | US | disclosed |
| US-3949136-A | OIL REPELLENTS, WATERPROOFING TEXTILES | CIBA-GEIGY AG (CH) | 1976-04-06 | — | — | US | disclosed |