Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Tetrabuthylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.59 |
| ▸ | TP53 | P04637 | 1/20 | 0.59 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | HTT | P42858 | 2/20 | 0.57 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.43 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.43 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.43 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL9136922 | 0.98 | MEN1 (0.57) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Tetrabuthylammonium SCHEMBL10876238 | 0.98 | DNM1 (0.57) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Tetrabuthylammonium SCHEMBL7114513 | 0.96 | DNM1 (0.59) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hexane SCHEMBL9016836 | 0.96 | DNM1 (0.59) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL8527490 | 0.96 | MEN1 (0.58) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL11126527 | 0.94 | MEN1 (0.66) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| SCHEMBL12558342 | 0.94 | DNM1 (0.56) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Tetrabuthylammonium SCHEMBL9655398 | 0.93 | MEN1 (0.53) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL11129711 | 0.93 | MEN1 (0.69) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL2253804 | 0.93 | MEN1 (0.69) | MEN1KMT2ATP53MAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1666972-B1 | USE OF A COMPOSITION CONTAINING POLYAMIC ACID FOR FORMING AN ANTI-REFLECTIVE COATING | NISSAN CHEMICAL IND LTD (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-7598182-B2 | having monomers of pyromellitic acid, 3,5-diaminobenzoic acid; use in a lithography for forming photoresist pattern | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20070004228-A1 | Polyamide acid-containing composition for forming antireflective film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| EP-1666972-A1 | POLYAMIDE ACID-CONTAINING COMPOSITION FOR FORMING ANTIREFLECTIVE FILM | Nissan Chemical Industries, Ltd. (JP) | 2006-06-07 | — | — | EP | disclosed |