Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGB1 | P09429 | 1/20 | 0.41 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.41 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.35 |
| ▸ | SHBG | P04278 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 1/20 | 0.35 |
| ▸ | CISD1 | Q9NZ45 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 3/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 4/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31186745 | 0.80 | CA2 (0.48) | HMGB1CXCL12PTGS1PTGS2CA1 | |
| SCHEMBL5422547 | 0.77 | GAA (0.49) | CA1CA2CYP1A2CYP3A4CYP2D6 | |
| SCHEMBL11519192 | 0.76 | HMGB1 (0.46) | HMGB1CXCL12PTGS1PTGS2CA1 | |
| SCHEMBL2921654 | 0.74 | HMGB1 (0.52) | HMGB1CXCL12PTGS1PTGS2CA1 | |
| SCHEMBL9405316 | 0.74 | CA1 (0.44) | HMGB1CXCL12PTGS1PTGS2CA1 | |
| SCHEMBL10880029 | 0.73 | CTBP2 (0.46) | CA2KMT2ANPC1HPGDLMNA | |
| SCHEMBL28057947 | 0.73 | MAPK8 (0.42) | CA1MAOBMEN1KMT2A | |
| SCHEMBL2152056 | 0.72 | ALDH1A1 (0.37) | CYP1A2CYP3A4MEN1KMT2AMAPT | |
| SCHEMBL3873211 | 0.71 | CA2 (0.63) | CA2SHBGESR1ESR2KDM4E | |
| SCHEMBL24325644 | 0.71 | LMNA (0.47) | HMGB1CXCL12PTGS1PTGS2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105566565-A | Hydrophobic association polymer with double bonds on side chains, method for preparing hydrophobic association polymer and application thereof | OCEAN UNIV CHINA | 2016-05-11 | — | — | CN | claimed |
| CN-119816783-A | Positive photosensitive resin composition | 日保丽公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119781249-A | Positive photosensitive resin composition, organic EL element barrier wall, organic EL element insulating film, and organic EL element | 日保丽公司 | 2025-04-08 | — | — | CN | disclosed |
| CN-113939767-B | Positive photosensitive resin composition and organic EL element partition wall | 日保丽公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-111538209-B | Photosensitive resin composition, organic EL element partition wall, and organic EL element | 日保丽公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-117882008-A | Positive photosensitive resin composition | 日保丽公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-117480451-A | Positive photosensitive resin composition and organic EL element partition wall | 日保丽公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-116940897-A | Photosensitive resin composition and organic EL element partition wall | 株式会社力森诺科 | 2023-10-24 | — | — | CN | disclosed |
| CN-112888748-B | Resin composition, cured film, printed wiring board with cured film, and method for producing same | 株式会社钟化 | 2023-09-22 | — | — | CN | disclosed |
| CN-114096568-B | Composition, cured product, method for producing cured product, and additive | 株式会社艾迪科 | 2023-08-18 | — | — | CN | disclosed |
| US-7482111-B2 | Negative radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-01-27 | — | — | US | disclosed |
| EP-1826612-A1 | Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings | JSR Corporation (JP) | 2007-08-29 | — | — | EP | disclosed |
| US-20070196765-A1 | RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS | JSR CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070190450-A1 | Negative radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070190465-A1 | Positively radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| CN-1934497-A | Negative radiation-sensitive resin composition | JSR CORP (JP) | 2007-03-21 | — | — | CN | disclosed |
| CN-1908816-A | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORP (JP) | 2007-02-07 | — | — | CN | disclosed |
| EP-1746461-A1 | NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1729176-A1 | POSITIVELY RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-12-06 | — | — | EP | disclosed |
| US-4131644-A | TREATING POLYBUTADIENE WITH A LEWIS ACID AND A SULFUR MELT, CARBONIZING | UBE INDUSTRIES, INC. (JP) | 1978-12-26 | — | — | US | disclosed |