SCHEMBL3865745

SCHEMBL3865745

C=C(CC)C(=O)O.C=C(CC)C(=O)O.C=C(CC)C(=O)O.CCC(CO)(CO)CO

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 5/20 0.38
FFAR3 O14843 1/20 0.32
TET3 O43151 1/20 0.31
TET1 Q8NFU7 1/20 0.31
GRIK1 P39086 1/20 0.30
GRIK2 Q13002 1/20 0.30
GRM1 Q13255 1/20 0.30
GRM2 Q14416 1/20 0.30
ALOX15 P16050 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Itaconate SCHEMBL27748501 0.83 ALOX15 (0.50) TET2ALOX15HSD17B10
Methacrylic Acid SCHEMBL1974753 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL27649 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL11006034 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL1485968 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL4878336 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL36868 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL9194150 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL443711 0.82 TGFBR1 (0.32) TET2
Methacrylic Acid SCHEMBL64985 0.82 TGFBR1 (0.32) TET2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130196144-A1 Laser Engraveable Compositions for Relief Image Printing Elements NAPP SYSTEMS, INC. 2013-08-01 US disclosed
US-7625959-B2 Curable jettable liquid for flexography AGFA GRAPHICS, N.V. (BE) 2009-12-01 US disclosed
EP-1637322-B1 Method for manufacturing a flexographic printing master AGFA GRAPHICS NV (BE) 2009-05-13 EP disclosed
EP-1637926-B1 Curable jettable liquid for the production of a flexographic printing plate AGFA GRAPHICS NV (BE) 2009-04-22 EP disclosed
US-7401552-B2 Method for manufacturing a flexographic printing master AGFA GRAPHICS N.V. (BE) 2008-07-22 US disclosed
US-20060073417-A1 Photopolymer plate and method for imaging the surface of a photopolymer plate HERMESDORF MARK 2006-04-06 US disclosed
EP-1637926-A2 Curable jettable liquid for the production of a flexographic printing plate Agfa-Gevaert (BE) 2006-03-22 EP disclosed
EP-1637322-A2 Method for manufacturing a flexographic printing master Agfa-Gevaert (BE) 2006-03-22 EP disclosed
US-20060055761-A1 Method for manufacturing a flexographic printing master AGFA-GEVAERT (BE) 2006-03-16 US disclosed
US-20060054040-A1 Curable jettable liquid for flexography AGFA-GEVAERT (BE) 2006-03-16 US disclosed
EP-0411839-A2 Image forming medium and image forming method CANON KABUSHIKI KAISHA (JP) 1991-02-06 EP disclosed
EP-0410803-A2 Image forming device CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP disclosed
EP-0363790-A2 Image forming method and image forming medium CANON KABUSHIKI KAISHA (JP) 1990-04-18 EP disclosed
EP-0362827-A1 Image forming method and image forming medium CANON KABUSHIKI KAISHA (JP) 1990-04-11 EP disclosed
EP-0360014-A1 Photosensitive material and image forming method using same CANON KABUSHIKI KAISHA (JP) 1990-03-28 EP disclosed
EP-0332455-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-09-13 EP disclosed
EP-0330504-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-30 EP disclosed
EP-0328364-A2 Photosensitive material CANON KABUSHIKI KAISHA (JP) 1989-08-16 EP disclosed
EP-0326424-A2 Photosensitive composition, photosensitive material, and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-02 EP disclosed
EP-0297583-A2 Photosensitive material and image forming method by use thereof CANON KABUSHIKI KAISHA (JP) 1989-01-04 EP disclosed