Malonic Acid

Malonic Acid

SCHEMBL3867313

CCC(C)=C(C)C(=O)O.CCC(C)=C(C)C(=O)O.O=C(O)CC(=O)O

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.45
SRR Q9GZT4 1/20 0.45
FFAR3 O14843 2/20 0.43
TDP1 Q9NUW8 2/20 0.36
ALDH1A1 P00352 1/20 0.36
THRB P10828 1/20 0.34
FNTA P49354 1/20 0.34
FNTB P49356 1/20 0.34
PGGT1B P53609 1/20 0.34
HDAC3 O15379 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
ADRA1A P35348 1/20 0.31
KDM4E B2RXH2 2/20 0.31
TSHR P16473 1/20 0.31
KDM6B O15054 1/20 0.31
KDM5C P41229 1/20 0.31
EGLN1 Q9GZT9 1/20 0.31
PHF8 Q9UPP1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8937947 0.89
SCHEMBL756883 0.89
SCHEMBL756885 0.89
Oxalic Acid SCHEMBL7518308 0.87 FFAR3 (0.42) FFAR3TDP1ALDH1A1THRBFNTA
Succinic Acid SCHEMBL3872448 0.85 LMNA (0.48) FFAR3TDP1ALDH1A1THRBFNTA
SCHEMBL102549 0.81 LDHA (0.44) LDHASRRFFAR3THRBFNTA
SCHEMBL19132995 0.81 LDHA (0.44) LDHASRRFFAR3THRBFNTA
SCHEMBL102551 0.81 LDHA (0.44) LDHASRRFFAR3THRBFNTA
Fumaric Acid SCHEMBL7512236 0.78 TSHR (0.43) FFAR3TDP1ALDH1A1THRBFNTA
SCHEMBL1696782 0.76 FFAR3 (0.33) FFAR3TDP1ALDH1A1THRBFNTA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2809688-A1 LASER ENGRAVEABLE COMPOSITIONS FOR RELIEF IMAGE PRINTING ELEMENTS NAPP SYSTEMS, INC. (US) 2014-12-10 EP disclosed
WO-2013116011-A1 LASER ENGRAVEABLE COMPOSITIONS FOR RELIEF IMAGE PRINTING ELEMENTS NAPP SYSTEMS, INC. (US) 2013-08-08 WO disclosed
US-7625959-B2 Curable jettable liquid for flexography AGFA GRAPHICS, N.V. (BE) 2009-12-01 US disclosed
EP-1637322-B1 Method for manufacturing a flexographic printing master AGFA GRAPHICS NV (BE) 2009-05-13 EP disclosed
EP-1637926-B1 Curable jettable liquid for the production of a flexographic printing plate AGFA GRAPHICS NV (BE) 2009-04-22 EP disclosed
US-7401552-B2 Method for manufacturing a flexographic printing master AGFA GRAPHICS N.V. (BE) 2008-07-22 US disclosed
US-20060073417-A1 Photopolymer plate and method for imaging the surface of a photopolymer plate HERMESDORF MARK 2006-04-06 US disclosed
EP-1637926-A2 Curable jettable liquid for the production of a flexographic printing plate Agfa-Gevaert (BE) 2006-03-22 EP disclosed
EP-1637322-A2 Method for manufacturing a flexographic printing master Agfa-Gevaert (BE) 2006-03-22 EP disclosed
US-20060054040-A1 Curable jettable liquid for flexography AGFA-GEVAERT (BE) 2006-03-16 US disclosed
US-5001032-A Photosensitive material containing a photosensitive and heat developable element and a polymerizable layer and image-forming method utilizing the same CANON KABUSHIKI KAISHA (JP) 1991-03-19 US disclosed
EP-0412851-A2 Photosensitive member and multi-color image forming method CANON KABUSHIKI KAISHA (JP) 1991-02-13 EP disclosed
EP-0410803-A2 Image forming device CANON KABUSHIKI KAISHA (JP) 1991-01-30 EP disclosed
EP-0363790-A2 Image forming method and image forming medium CANON KABUSHIKI KAISHA (JP) 1990-04-18 EP disclosed
EP-0362827-A1 Image forming method and image forming medium CANON KABUSHIKI KAISHA (JP) 1990-04-11 EP disclosed
EP-0360014-A1 Photosensitive material and image forming method using same CANON KABUSHIKI KAISHA (JP) 1990-03-28 EP disclosed
EP-0332455-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-09-13 EP disclosed
EP-0330504-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-30 EP disclosed
EP-0328364-A2 Photosensitive material CANON KABUSHIKI KAISHA (JP) 1989-08-16 EP disclosed
EP-0326424-A2 Photosensitive composition, photosensitive material, and image forming method CANON KABUSHIKI KAISHA (JP) 1989-08-02 EP disclosed