Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP8 | P22894 | 1/20 | 0.30 |
| ▸ | MMP13 | P45452 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15031586 | 0.77 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL597457 | 0.72 | ALDH1A1 (0.36) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL321209 | 0.71 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL712912 | 0.71 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL3795467 | 0.70 | CA2 (0.39) | ALDH1A1L3MBTL1CA1CA2MMP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL8540103 | 0.69 | ALDH1A1 (0.43) | ALDH1A1L3MBTL1CA1CA2TSHR | |
| Trifluoromethanesulfonic Acid SCHEMBL29199623 | 0.69 | ALDH1A1 (0.43) | ALDH1A1L3MBTL1CA1CA2TSHR | |
| SCHEMBL357194 | 0.69 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 | |
| Hydrochloric Acid SCHEMBL11271021 | 0.69 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 | |
| Water SCHEMBL9500989 | 0.69 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |