⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL97345 | 0.82 | CNR2 (0.32) | — | |
| SCHEMBL14491221 | 0.82 | CNR2 (0.32) | — | |
| SCHEMBL16385622 | 0.82 | CNR2 (0.32) | — | |
| SCHEMBL14040417 | 0.82 | CNR2 (0.32) | — | |
| SCHEMBL4995636 | 0.80 | CNR2 (0.32) | — | |
| SCHEMBL23021671 | 0.76 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2800832 | 0.76 | CA1 (0.35) | — | |
| Decane SCHEMBL6385306 | 0.75 | EPHX1 (0.36) | — | |
| SCHEMBL3869288 | 0.74 | — | — | |
| SCHEMBL3881606 | 0.74 | CA2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |