Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR1 | Q92633 | 1/20 | 0.35 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.34 |
| ▸ | FDPS | P14324 | 2/20 | 0.32 |
| ▸ | CES1 | P23141 | 5/20 | 0.31 |
| ▸ | FAAH | O00519 | 4/20 | 0.31 |
| ▸ | CES2 | O00748 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL18008280 | 0.97 | LPAR1 (0.34) | LPAR1LPAR3ALDH1A1L3MBTL1EPHX1 | |
| Dimethylamine SCHEMBL18008050 | 0.93 | EPHX1 (0.35) | LPAR1LPAR3ALDH1A1L3MBTL1EPHX1 | |
| SCHEMBL18007903 | 0.85 | EPHX1 (0.41) | LPAR1LPAR3EPHX1CES1FAAH | |
| Allylamine SCHEMBL18008491 | 0.84 | ALDH1A1 (0.33) | ALDH1A1FDPS | |
| SCHEMBL18008458 | 0.83 | CES2 (0.45) | LPAR1LPAR3EPHX1CES1FAAH | |
| Ammonia Solution, Strong SCHEMBL18008792 | 0.83 | EPHX1 (0.39) | LPAR1LPAR3EPHX1CES1FAAH | |
| SCHEMBL18008469 | 0.81 | CES2 (0.48) | LPAR1LPAR3EPHX1CES1FAAH | |
| SCHEMBL679295 | 0.81 | CES2 (0.48) | LPAR1LPAR3EPHX1CES1FAAH | |
| SCHEMBL3871219 | 0.81 | CES2 (0.48) | LPAR1LPAR3EPHX1CES1FAAH | |
| SCHEMBL17773374 | 0.81 | CES2 (0.48) | LPAR1LPAR3EPHX1CES1FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230384679-A1 | PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-30 | — | — | US | disclosed |
| CN-113252759-A | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2021-08-13 | — | — | CN | disclosed |
| US-20200326299-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2020-10-15 | — | — | US | disclosed |
| US-10732144-B2 | Electrochemical gas sensor and electrolyte for an electrochemical gas sensor | Dräger Safety AG & Co. KGaA (DE) | 2020-08-04 | — | — | US | disclosed |
| EP-3367088-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-08-29 | — | — | EP | disclosed |
| US-20180031516-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-02-01 | — | — | US | disclosed |
| EP-3259583-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2017-12-27 | — | — | EP | disclosed |
| WO-2016131549-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2016-08-25 | — | — | WO | disclosed |
| US-9250531-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-8993211-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20060141383-A1 | Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions | JSR CORPORATION (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1586570-A1 | SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030170561-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |