SCHEMBL3871190

SCHEMBL3871190

O=C(C[S+]1CCCC1)c1cccc2ccccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.56
ALDH1A1 P00352 5/20 0.49
MAPT P10636 4/20 0.49
HPGD P15428 3/20 0.49
LMNA P02545 3/20 0.49
POLB P06746 3/20 0.49
KDM4E B2RXH2 3/20 0.49
MEN1 O00255 2/20 0.49
GMNN O75496 2/20 0.49
MAPK1 P28482 2/20 0.49
BLM P54132 2/20 0.49
PMP22 Q01453 2/20 0.49
KMT2A Q03164 2/20 0.49
NPSR1 Q6W5P4 2/20 0.49
CMKLR1 Q99788 2/20 0.49
TDP1 Q9NUW8 2/20 0.49
TP53 P04637 1/20 0.49
CYP1A2 P05177 1/20 0.49
CYP3A4 P08684 1/20 0.49
CYP2D6 P10635 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL4048814 0.98 PTPN1 (0.54) PTPN1ALDH1A1MAPTHPGDLMNA
Trifluoromethanesulfonic Acid SCHEMBL29625806 0.87 PTPN1 (0.43) PTPN1ALDH1A1MAPTHPGDLMNA
Trifluoromethanesulfonic Acid SCHEMBL3872598 0.87 PTPN1 (0.43) PTPN1ALDH1A1MAPTHPGDLMNA
SCHEMBL7044332 0.87 PTPN1 (0.43) PTPN1ALDH1A1MAPTHPGDLMNA
SCHEMBL3881528 0.85 PTPN1 (0.42) PTPN1ALDH1A1MAPTHPGDLMNA
Hydrochloric Acid SCHEMBL3921075 0.83 ALDH1A1 (0.52) PTPN1ALDH1A1MAPTHPGDLMNA
SCHEMBL3877973 0.81 AR (0.40) PTPN1ALDH1A1MAPTHPGDLMNA
SCHEMBL3877031 0.81 PTPN1 (0.39) PTPN1ALDH1A1MAPTHPGDLMNA
SCHEMBL3879944 0.80 PTPN1 (0.38) PTPN1ALDH1A1MAPTHPGDLMNA
SCHEMBL3870778 0.80 SMN1; SMN2 (0.37) PTPN1ALDH1A1MAPTHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1641849-A1 PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS Symyx Technologies, Inc. (US) 2006-04-05 EP disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed
WO-2005000923-A1 PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS SYMYX TECHNOLOGIES, INC. (US) 2005-01-06 WO disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed