SCHEMBL3871886

SCHEMBL3871886

O=S(=O)(O)C(F)(F)c1cccc2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
KDM4E B2RXH2 2/20 0.44
PTPN1 P18031 2/20 0.44
ACP3 P15309 2/20 0.41
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
CA9 Q16790 2/20 0.40
PTPRC P08575 1/20 0.40
RORA P35398 1/20 0.38
RORC P51449 1/20 0.38
NR1H2 P55055 1/20 0.38
NR1H4 Q96RI1 1/20 0.38
KIF11 P52732 1/20 0.38
CNR2 P34972 1/20 0.38
CYP1A2 P05177 1/20 0.38
ALDH1A1 P00352 1/20 0.38
GLA P06280 1/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3876388 0.84 KDM4E (0.43) MEN1KMT2AKDM4EPTPN1ACP3
SCHEMBL14111208 0.82 KDM4E (0.46) MEN1KMT2AKDM4EACP3CA1
SCHEMBL35772 0.81 KEAP1 (0.43) MEN1KMT2AKDM4EACP3CA1
SCHEMBL29763080 0.81 KEAP1 (0.43) MEN1KMT2AKDM4EACP3CA1
SCHEMBL11606350 0.79 KEAP1 (0.42) MEN1KMT2AKDM4EACP3CA1
SCHEMBL11651931 0.79 KEAP1 (0.42) MEN1KMT2AKDM4EACP3CA1
SCHEMBL1719758 0.79 KEAP1 (0.42) MEN1KMT2AKDM4EACP3CA1
Benzene SCHEMBL27652672 0.78 ACP3 (0.44) MEN1KMT2AKDM4EACP3CA1
SCHEMBL11149740 0.78 CA1 (0.44) MEN1KMT2AKDM4EACP3CA1
SCHEMBL28622385 0.77 KDM4E (0.41) MEN1KMT2AKDM4EACP3CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
US-7288359-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-10-30 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed