SCHEMBL3876388

SCHEMBL3876388

O=S(=O)(O)C(F)(F)C(F)(F)c1cccc2ccccc12

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.43
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
RORA P35398 1/20 0.40
RORC P51449 1/20 0.40
NR1H2 P55055 1/20 0.40
NR1H4 Q96RI1 1/20 0.40
ACP3 P15309 2/20 0.40
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA9 Q16790 1/20 0.39
PTPRC P08575 1/20 0.39
KIF11 P52732 1/20 0.38
ALDH1A1 P00352 2/20 0.37
HPGD P15428 2/20 0.37
HSD17B10 Q99714 2/20 0.37
CNR2 P34972 1/20 0.37
GLA P06280 1/20 0.37
POLB P06746 1/20 0.37
GAA P10253 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3871886 0.84 MEN1 (0.44) KDM4EMEN1KMT2ARORARORC
SCHEMBL14111208 0.81 KDM4E (0.46) KDM4EMEN1KMT2ARORARORC
SCHEMBL29763080 0.79 KEAP1 (0.43) KDM4EMEN1KMT2AACP3CA1
SCHEMBL35772 0.79 KEAP1 (0.43) KDM4EMEN1KMT2AACP3CA1
SCHEMBL11606350 0.78 KEAP1 (0.42) KDM4EMEN1KMT2AACP3CA1
SCHEMBL11651931 0.78 KEAP1 (0.42) KDM4EMEN1KMT2AACP3CA1
SCHEMBL1719758 0.78 KEAP1 (0.42) KDM4EMEN1KMT2AACP3CA1
SCHEMBL28784604 0.77 RORC (0.38) KDM4EMEN1KMT2ARORARORC
SCHEMBL15913865 0.77 ALDH1A1 (0.43) KDM4EMEN1KMT2AACP3PTPRC
SCHEMBL18936152 0.77 ALDH1A1 (0.43) KDM4EMEN1KMT2AACP3PTPRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20080187859-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2008-08-07 US disclosed
US-7323286-B2 Photosensitive composition, compound used in the same, and patterning method using the same FUJIFILM CORPORATION (JP) 2008-01-29 US disclosed
US-7297461-B2 Radiation sensitive resin composition JSR CORPORATION (JP) 2007-11-20 US disclosed
US-7288359-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-10-30 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed