Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.41 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA7 | P43166 | 2/20 | 0.40 |
| ▸ | CA9 | Q16790 | 2/20 | 0.40 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.40 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.39 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.39 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.39 |
| ▸ | CDC25B | P30305 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.39 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | CA6 | P23280 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL542006 | 0.94 | CDC25B (0.44) | ALDH1A1ALOX15TSHRPBRM1AKR1C3 | |
| Naphthalene SCHEMBL28213983 | 0.93 | NR4A1 (0.47) | ALDH1A1ALOX15TSHRPBRM1AKR1C3 | |
| SCHEMBL4431134 | 0.91 | ACMSD (0.44) | ALDH1A1ALOX15TSHRPBRM1CDC25B | |
| SCHEMBL692388 | 0.87 | CA12 (0.46) | ALDH1A1ALOX15TSHRPBRM1CA12 | |
| SCHEMBL2746318 | 0.85 | ALDH1A1 (0.43) | ALDH1A1ALOX15TSHRPBRM1AKR1C3 | |
| SCHEMBL28226287 | 0.83 | ALDH1A1 (0.48) | ALDH1A1ALOX15TSHRPBRM1AKR1C3 | |
| SCHEMBL2746986 | 0.83 | CA12 (0.43) | ALDH1A1ALOX15TSHRPBRM1CA12 | |
| SCHEMBL2746786 | 0.83 | HSD17B10 (0.40) | ALDH1A1ALOX15TSHRPBRM1AKR1C3 | |
| SCHEMBL5666504 | 0.82 | ALDH1A1 (0.46) | ALDH1A1ALOX15TSHRAKR1C3CA12 | |
| SCHEMBL5858945 | 0.82 | ALDH1A1 (0.46) | ALDH1A1ALOX15TSHRPBRM1AKR1C3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9868820-B2 | Polyarylene materials | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-01-16 | — | — | US | claimed |
| CN-105384915-A | Polyarylene materials | ROHM & HAAS ELECT MATERIALS KOREA LTD | 2016-03-09 | — | — | CN | claimed |
| US-20160060393-A1 | POLYARYLENE MATERIALS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-03-03 | — | — | US | claimed |
| EP-2990430-A1 | POLYARYLENE MATERIALS | Rohm and Haas Electronic Materials LLC (US) | 2016-03-02 | — | — | EP | claimed |
| WO-2012005648-A1 | UNSATURATED OLIGIO OR POLYESTER | PERSTORP AB (SE) | 2012-01-12 | — | — | WO | claimed |
| US-5066771-A | Endcapped with triple bonds, made from aromatic acid and amine, self-curing, polyimide properties, soluble in organic solvents | KOZO IIZUKA, DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1991-11-19 | — | — | US | claimed |
| JP-63196564-A | — | — | None | — | — | JP | disclosed |
| US-12379660-B2 | Adhesion promoting photoresist underlayer composition | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-08-05 | — | — | US | disclosed |
| CN-115197565-B | Semi-crystalline polyamide composition based on short diamines with high glass transition temperature, process for its production and use thereof | 阿科玛法国公司 | 2024-10-11 | — | — | CN | disclosed |
| CN-115197565-A | Semi-crystalline polyamide composition based on short diamines with high glass transition temperature, method for the production thereof and use thereof | 阿科玛法国公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-110446740-B | Semi-crystalline polyamide compositions based on short diamines with high glass transition temperature, method for the production thereof and use thereof | 阿科玛法国公司 | 2022-07-12 | — | — | CN | disclosed |
| US-20220197143-A1 | ADHESION PROMOTING PHOTORESIST UNDERLAYER COMPOSITION | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-06-23 | — | — | US | disclosed |
| CN-114644875-A | Adhesion promoting photoresist underlayer composition | 罗门哈斯电子材料有限责任公司 | 2022-06-21 | — | — | CN | disclosed |
| US-5681967-A | ENDCAPPING POLYAMIC ACIDS | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1997-10-28 | — | — | US | disclosed |
| US-5606014-A | MOLECULAR WEIGHT CONTROL; CYCLODEHYDRATION | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1997-02-25 | — | — | US | disclosed |
| WO-1997006200-A1 | IMIDE OLIGOMERS AND CO-OLIGOMERS CONTAINING PENDENT PHENYLETHYNYL GROUPS AND POLYMERS THEREFROM | NATIONAL AERONAUTICS & SPACE ADMINISTRATION (US) | 1997-02-20 | — | — | WO | disclosed |
| US-5567800-A | MOLECULAR WEIGHT CONTROLLED AROMATIC POLYIMIDES; ELONGATION, HIGH GLASS TRANSITION TEMPERATURE, TOUGHNESS | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1996-10-22 | — | — | US | disclosed |
| US-5066771-A | Endcapped with triple bonds, made from aromatic acid and amine, self-curing, polyimide properties, soluble in organic solvents | KOZO IIZUKA, DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1991-11-19 | — | — | US | disclosed |
| US-5066771-A | Endcapped with triple bonds, made from aromatic acid and amine, self-curing, polyimide properties, soluble in organic solvents | KOZO IIZUKA, DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1991-11-19 | — | — | US | disclosed |
| JP-S63196564-A | PRODUCTION OF IMIDE OLIGOMER | AGENCY OF IND SCIENCE & TECHNOL | 1988-08-15 | — | — | JP | disclosed |