Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | FDFT1 | P37268 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL387735 | 0.74 | CYP2C9 (0.33) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL92309 | 0.74 | FDFT1 (0.35) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL4806931 | 0.73 | FDFT1 (0.31) | FDFT1 | |
| SCHEMBL16471018 | 0.71 | — | — | |
| SCHEMBL855803 | 0.71 | — | — | |
| SCHEMBL10305878 | 0.71 | HSD11B1 (0.35) | FDFT1HSD11B1 | |
| SCHEMBL13445824 | 0.70 | ALDH1A1 (0.30) | — | |
| SCHEMBL16566372 | 0.70 | FDFT1 (0.36) | CYP2C9FDFT1 | |
| SCHEMBL13697603 | 0.70 | FDFT1 (0.33) | CYP2C9FDFT1 | |
| SCHEMBL29226312 | 0.70 | FDFT1 (0.40) | CYP2C9FDFT1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080318156-A1 | Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography | CORNELL RESEARCH FOUNDATION, INC. | 2008-12-25 | — | — | US | claimed |
| EP-1991910-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | Cornell Research Foundation, Inc. (US) | 2008-11-19 | — | — | EP | claimed |
| WO-2007094784-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | CORNELL RESEARCH FOUNDATION, INC. (US) | 2007-08-23 | — | — | WO | claimed |
| US-9829792-B2 | Monomer, polymer, positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-28 | — | — | US | disclosed |
| US-20170008982-A1 | MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-20170008982-A1 | MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-9522868-B2 | Tetrakis(ether-substituted formylphenyl) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| EP-2299325-B1 | Resist composition, resist pattern forming method and compound | TOKYO OHKA KOGYO CO LTD (JP) | 2016-02-17 | — | — | EP | disclosed |
| EP-2299325-B1 | Resist composition, resist pattern forming method and compound | TOKYO OHKA KOGYO CO LTD (JP) | 2016-02-17 | — | — | EP | disclosed |
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-01-21 | — | — | US | disclosed |
| US-9140988-B2 | Positive resist composition, monomer, polymer, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-22 | — | — | US | disclosed |
| US-20080096126-A1 | Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| EP-1882981-A1 | POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-01-30 | — | — | EP | disclosed |
| WO-2007094784-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | CORNELL RESEARCH FOUNDATION, INC. (US) | 2007-08-23 | — | — | WO | disclosed |
| EP-1806619-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1806619-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-20070148594-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-06-28 | — | — | US | disclosed |
| CN-1918217-A | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2007-02-21 | — | — | CN | disclosed |
| EP-1717261-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-6270942-B1 | PHOTOSENSITVE POLYMER CONTAINING NORBORNENE UNITS, MALEIC ANHYDRIDE UNITS AND UNSATURATED ESTER | SAMSUNG ELECTRONICS CO., LTD (KR) | 2001-08-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | AHR, PAH, ALK | CYP2C9 137/4885FDFT1 3043/4885HSD11B1 699/4885 |
| US-20170008982-A1 | MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | PARG, PARN, MMS19 | CYP2C9 4509/4885FDFT1 3851/4885HSD11B1 2278/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.