SCHEMBL3889130

SCHEMBL3889130

CCOCCC[Si](C)(C)OC(C)=O

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
TSHR P16473 2/20 0.45
KMT2A Q03164 2/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HTT P42858 3/20 0.37
THRB P10828 1/20 0.36
HPGD P15428 4/20 0.35
RAB9A P51151 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
NPC1 O15118 2/20 0.34
CES2 O00748 1/20 0.33
TP53 P04637 1/20 0.33
GAA P10253 1/20 0.33
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13151098 0.88 ALDH1A1 (0.48) ALDH1A1TSHRKMT2AL3MBTL1HTT
SCHEMBL3890831 0.87 ALDH1A1 (0.36) ALDH1A1TSHRKMT2AHTTTHRB
SCHEMBL3890067 0.85 ALDH1A1 (0.45) ALDH1A1TSHRKMT2AL3MBTL1HTT
SCHEMBL3901977 0.82 ALDH1A1 (0.47) ALDH1A1TSHRKMT2AL3MBTL1HTT
SCHEMBL705061 0.81 KDM4E (0.35) ALDH1A1TSHRLMNAHSD17B10
SCHEMBL712067 0.81 KDM4E (0.35) ALDH1A1TSHRLMNAHSD17B10
SCHEMBL7758879 0.80 ALDH1A1 (0.50) ALDH1A1TSHRKMT2AL3MBTL1HTT
SCHEMBL3901989 0.80 TSHR (0.38) ALDH1A1TSHRHPGDSMN1; SMN2GAA
SCHEMBL476046 0.79 ALDH1A1 (0.43) ALDH1A1TSHRCES2LMNAHSD17B10
SCHEMBL475984 0.78 ALDH1A1 (0.41) ALDH1A1TSHRCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed