SCHEMBL3901977

SCHEMBL3901977

CCOCCC[Si](OC(C)=O)(OC(C)=O)OC(C)=O

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.47
TSHR P16473 3/20 0.47
KMT2A Q03164 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
THRB P10828 1/20 0.37
HPGD P15428 4/20 0.35
HTT P42858 3/20 0.35
RAB9A P51151 3/20 0.35
NPC1 O15118 1/20 0.35
LMNA P02545 1/20 0.34
HSD17B10 Q99714 1/20 0.34
CES2 O00748 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
TP53 P04637 1/20 0.34
GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1231821 0.88 ALDH1A1 (0.35) ALDH1A1TSHRKMT2ATHRBHTT
SCHEMBL3891542 0.86 ALDH1A1 (0.38) ALDH1A1TSHRKMT2ATHRBHTT
SCHEMBL12678049 0.85 ALDH1A1 (0.45) ALDH1A1TSHRKMT2ATHRBHTT
SCHEMBL3889130 0.82 ALDH1A1 (0.45) ALDH1A1TSHRKMT2AL3MBTL1THRB
SCHEMBL3890067 0.82 ALDH1A1 (0.45) ALDH1A1TSHRKMT2AL3MBTL1THRB
SCHEMBL703686 0.80 KDM4E (0.36) ALDH1A1TSHRLMNAHSD17B10
SCHEMBL704685 0.80 KDM4E (0.36) ALDH1A1TSHRLMNAHSD17B10
SCHEMBL14111135 0.79 CES2 (0.32) ALDH1A1TSHRCES2
SCHEMBL143448 0.79 CES2 (0.35) CES2
SCHEMBL3899362 0.79 TSHR (0.39) ALDH1A1TSHRHPGDLMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed