Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13151076 | 0.85 | ALDH1A1 (0.43) | TSHRALDH1A1RECQLGAAHPGD | |
| SCHEMBL712067 | 0.84 | KDM4E (0.35) | TSHRALDH1A1 | |
| SCHEMBL705061 | 0.84 | KDM4E (0.35) | TSHRALDH1A1 | |
| SCHEMBL7758879 | 0.83 | ALDH1A1 (0.50) | TSHRALDH1A1GAASMN1; SMN2 | |
| SCHEMBL3898090 | 0.83 | TSHR (0.38) | TSHRALDH1A1RECQLGAAHPGD | |
| SCHEMBL3899362 | 0.81 | TSHR (0.39) | TSHRALDH1A1RECQLGAAHPGD | |
| SCHEMBL3889130 | 0.80 | ALDH1A1 (0.45) | TSHRALDH1A1GAAHPGDSMN1; SMN2 | |
| SCHEMBL13151126 | 0.80 | TSHR (0.36) | TSHRALDH1A1RECQLGAAHPGD | |
| SCHEMBL704202 | 0.79 | ALDH1A1 (0.35) | TSHRALDH1A1 | |
| SCHEMBL3890831 | 0.79 | ALDH1A1 (0.36) | TSHRALDH1A1HPGDEPHX2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | claimed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20050274692-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050277755-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |