⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5442827 | 0.89 | ALDH1A1 (0.43) | — | |
| SCHEMBL20461 | 0.89 | — | — | |
| SCHEMBL8581776 | 0.80 | — | — | |
| SCHEMBL1663390 | 0.80 | — | — | |
| SCHEMBL10348508 | 0.80 | — | — | |
| SCHEMBL1415964 | 0.80 | — | — | |
| SCHEMBL17393533 | 0.80 | — | — | |
| Water SCHEMBL6694512 | 0.80 | — | — | |
| SCHEMBL11353006 | 0.80 | — | — | |
| Charcoal, Activated SCHEMBL6544903 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115907464-A | Silicon sand carbon footprint analysis method and system for crystalline silicon photovoltaic component raw material | 浙江正泰智维能源服务有限公司 | 2023-04-04 | — | — | CN | disclosed |
| CN-101007725-B | Water-resistant chlorine oxygen magnesium silicon series composite material and its preparing process | NANJING SHANGBO TECHNOLOGY INDUSTRY CO LTD | 2010-05-19 | — | — | CN | disclosed |
| US-7553775-B2 | Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-06-30 | — | — | US | disclosed |
| CN-101007725-A | Water-resistant chlorine oxygen magnesium silicon series composite material and its preparing process | WANG HUILING (CN) | 2007-08-01 | — | — | CN | disclosed |
| US-20060046447-A1 | Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-03-02 | — | — | US | disclosed |