Water

Water

SCHEMBL6694512

Cl[Si](Cl)(Cl)Cl.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL29797477 1.00
Water SCHEMBL28464833 1.00
Water SCHEMBL29797333 1.00
Water SCHEMBL29797310 1.00 ALDH1A1 (0.38)
Water SCHEMBL29246716 0.91
SCHEMBL20461 0.89
SCHEMBL5442827 0.89 ALDH1A1 (0.43)
SCHEMBL11353006 0.80
SCHEMBL10348508 0.80
Charcoal, Activated SCHEMBL6544903 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025134787-A1 EMBEDDING METHOD AND EMBEDDING SYSTEM 東京エレクトロン株式会社 2025-06-26 WO disclosed
CN-209668783-U A kind of energy saver of silicon tetrachloride synthesis TIANJIN ZHONGKE TUOXIN TECH CO LTD 2019-11-22 CN disclosed
CN-110114400-A Crosslinkable rubber composition and crosslinked rubber product 日本瑞翁株式会社 2019-08-09 CN disclosed
CN-109467091-A A kind of energy saver and method of silicon tetrachloride synthesis 天津中科拓新科技有限公司 2019-03-15 CN disclosed
CN-101802984-B Method for forming silicon oxide layer on substrate APPLIED MATERIALS INC 2014-03-12 CN disclosed
CN-101528974-B Method for deposition of dielectric layer in clearance formed on a substrate and filling the clearance using the dielectric material APPLIED MATERIALS INC 2013-07-17 CN disclosed
CN-202465290-U Trichlorosilane heat pump rectifying energy-saving device HUALU ENGINEERING TECHNOLOGY CO LTD 2012-10-03 CN disclosed
CN-101802984-A Method for forming silicon oxide layer on substrate APPLIED MATERIALS INC 2010-08-11 CN disclosed
CN-101528974-A Formation of high quality dielectric films of silicon dioxide for sti: usage of different siloxane-based precursors for harp II-remote plasma enhanced deposition processes APPLIED MATERIALS INC (US) 2009-09-09 CN disclosed
US-20040047793-A1 Method for producing trichlorosilane SOLARWORLD AKTIENGESELLSCHAFT (DE) 2004-03-11 US disclosed
US-20040047794-A1 Fluidized bed reactor made of a nickel-chrome-molybdenum alloy for the synthesis of trichlorosilane SOLARWORLD AKTIENGESELLSCHAFT (DE) 2004-03-11 US disclosed
CN-1035367-C Polymer film ICI PLC (GB) 1997-07-09 CN disclosed
CN-1067847-A Thin polymer film IMP CHEMIZAL IND PLC (GB) 1993-01-13 CN disclosed