Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | PHLPP2 | Q6ZVD8 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7175816 | 0.72 | ALDH1A1 (0.52) | CYP1A2CYP3A4MAPTTSHRMAPK1 | |
| SCHEMBL9488058 | 0.72 | ALDH1A1 (0.30) | TSHR | |
| SCHEMBL447255 | 0.72 | ESR1 (0.46) | CYP3A4MAPTTSHR | |
| SCHEMBL23325316 | 0.72 | TSHR (0.48) | SLC2A1MAPTTSHRMAPK1TDP1 | |
| SCHEMBL2056786 | 0.70 | MEN1 (0.40) | CYP1A2CYP3A4MAPTTSHRMAPK1 | |
| SCHEMBL9626237 | 0.70 | SLC2A1 (0.71) | SLC2A1CYP1A2CYP3A4MAPTTSHR | |
| SCHEMBL61574 | 0.70 | SLC2A1 (0.71) | SLC2A1CYP1A2CYP3A4MAPTTSHR | |
| SCHEMBL27726280 | 0.68 | CA1 (0.52) | SLC2A1CYP3A4MAPTTSHRMAPK1 | |
| SCHEMBL24433604 | 0.68 | ALDH1A1 (0.43) | CYP1A2CYP3A4MAPTMAPK1TDP1 | |
| SCHEMBL18352004 | 0.68 | L3MBTL1 (0.39) | SLC2A1CYP1A2CYP3A4MAPTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1765592-B1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2009-01-28 | — | — | EP | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| EP-1765592-A1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | Agfa Graphics N.V. (BE) | 2007-03-28 | — | — | EP | disclosed |
| WO-2006005688-A1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. | AGFA-GEVAERT (BE) | 2006-01-19 | — | — | WO | disclosed |
| EP-1614541-A2 | Method of making a lithographic printing plate. | Agfa-Gevaert (BE) | 2006-01-11 | — | — | EP | disclosed |
| EP-0239868-B1 | PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE | BASF Aktiengesellschaft (DE) | 1989-12-27 | — | — | EP | disclosed |
| US-4857438-A | Photochromic system and layers produced therewith | BASF AKTIENGESELLSCHAFT (DE) | 1989-08-15 | — | — | US | disclosed |
| EP-0239868-A1 | Photochromic system, layer prepared thereof and its use | BASF Aktiengesellschaft (DE) | 1987-10-07 | — | — | EP | disclosed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4139390-A | Presensitized printing plate having a print-out image | EASTMAN KODAK COMPANY (US) | 1979-02-13 | — | — | US | disclosed |