SCHEMBL3901638

SCHEMBL3901638

CCN(CC)c1ccc(C(Nc2ccccc2)c2ccc(N(CC)CC)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.54
NPC1 O15118 3/20 0.54
RAB9A P51151 3/20 0.54
KMT2A Q03164 3/20 0.54
NOX1 Q9Y5S8 1/20 0.54
CNR2 P34972 8/20 0.50
ALDH1A1 P00352 4/20 0.46
TSHR P16473 3/20 0.46
KDM1A O60341 1/20 0.44
VDR P11473 1/20 0.44
TDP1 Q9NUW8 3/20 0.43
KDM4E B2RXH2 2/20 0.43
MAPT P10636 2/20 0.43
LMNA P02545 1/20 0.43
POLB P06746 1/20 0.43
GAA P10253 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
NPY5R Q15761 1/20 0.43
MAPK1 P28482 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5009542 0.83 CNR2 (0.56) MEN1NPC1RAB9AKMT2ANOX1
SCHEMBL13561464 0.82 CFTR (0.46) MEN1KMT2AALDH1A1TSHRVDR
SCHEMBL21420999 0.82 CFTR (0.46) MEN1KMT2AALDH1A1TSHRVDR
SCHEMBL80508 0.80 VDR (0.61) MEN1KMT2ACNR2ALDH1A1TSHR
SCHEMBL4314634 0.78 CNR2 (0.52) MEN1NPC1RAB9AKMT2ANOX1
SCHEMBL5010140 0.76 ALDH1A1 (0.53) MEN1NPC1RAB9AKMT2ANOX1
SCHEMBL109699 0.76 CNR2 (0.53) MEN1NPC1RAB9AKMT2ANOX1
SCHEMBL9514595 0.76 NPC1 (0.68) MEN1NPC1RAB9AKMT2ANOX1
SCHEMBL27776204 0.76 CNR2 (0.53) MEN1NPC1RAB9AKMT2ANOX1
SCHEMBL141889 0.76 NPC1 (0.68) MEN1NPC1RAB9AKMT2ANOX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1765592-B1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2009-01-28 EP disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
EP-1765592-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR Agfa Graphics N.V. (BE) 2007-03-28 EP disclosed
WO-2006005688-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. AGFA-GEVAERT (BE) 2006-01-19 WO disclosed
EP-1614541-A2 Method of making a lithographic printing plate. Agfa-Gevaert (BE) 2006-01-11 EP disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
EP-0239868-A1 Photochromic system, layer prepared thereof and its use BASF Aktiengesellschaft (DE) 1987-10-07 EP disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed