SCHEMBL3899362

SCHEMBL3899362

COCCC[Si](OC(C)=O)(OC(C)=O)OC(C)=O

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39
ALDH1A1 P00352 5/20 0.39
RECQL P46063 1/20 0.35
GAA P10253 2/20 0.32
EPHX2 P34913 2/20 0.32
POLB P06746 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HPGD P15428 1/20 0.30
KDM4E B2RXH2 2/20 0.30
LMNA P02545 1/20 0.30
MAPK1 P28482 1/20 0.30
HIF1A Q16665 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703686 0.84 KDM4E (0.36) TSHRALDH1A1KDM4ELMNAMAPK1
SCHEMBL704685 0.84 KDM4E (0.36) TSHRALDH1A1KDM4ELMNAMAPK1
SCHEMBL1231821 0.83 ALDH1A1 (0.35) TSHRALDH1A1KDM4EMAPK1HIF1A
SCHEMBL303979 0.81 KDM4E (0.40) TSHRALDH1A1KDM4ELMNAMAPK1
SCHEMBL3898090 0.81 TSHR (0.38) TSHRALDH1A1RECQLGAAEPHX2
SCHEMBL3901989 0.81 TSHR (0.38) TSHRALDH1A1RECQLGAAEPHX2
SCHEMBL3901977 0.79 ALDH1A1 (0.47) TSHRALDH1A1GAASMN1; SMN2HPGD
SCHEMBL707980 0.78 ALDH1A1 (0.37) TSHRALDH1A1TDP1KDM4ELMNA
SCHEMBL3891542 0.78 ALDH1A1 (0.38) TSHRALDH1A1EPHX2SMN1; SMN2
SCHEMBL334963 0.78 ALDH1A1 (0.38) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US claimed
US-7485690-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-03 US disclosed
US-7385021-B2 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-06-10 US disclosed
US-20050274692-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed
US-20050277755-A1 Sacrificial film-forming composition, patterning process, sacrificial film and removal method SHIN-ETSU CHEMICAL CO., LTD. 2005-12-15 US disclosed