⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251442 | 0.82 | ALDH1A1 (0.33) | — | |
| SCHEMBL1154 | 0.82 | — | — | |
| SCHEMBL1618168 | 0.79 | — | — | |
| SCHEMBL11413996 | 0.79 | — | — | |
| SCHEMBL4132479 | 0.78 | — | — | |
| Methylene Chloride SCHEMBL1778622 | 0.78 | — | — | |
| SCHEMBL6498291 | 0.78 | — | — | |
| SCHEMBL15674477 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL7542079 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL15821191 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7553775-B2 | Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-06-30 | — | — | US | disclosed |
| CN-100433384-C | Method for coating semiconductor surface and use | TOKYO SHIBAURA ELECTRIC CO (JP) | 2008-11-12 | — | — | CN | disclosed |
| CN-1744336-A | Method for coating semiconductor surface and use | TOKYO SHIBAURA ELECTRIC CO (JP) | 2006-03-08 | — | — | CN | disclosed |
| US-20060046447-A1 | Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-03-02 | — | — | US | disclosed |