Methacrylic Acid

Methacrylic Acid

SCHEMBL390857

C=C(C)C(=O)O.C=C(C=Cc1ccccc1)C(=O)OCC

nearest known ligand 0.53

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
RAB9A P51151 4/20 0.51
GLA P06280 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
ALDH1A1 P00352 5/20 0.47
MAPT P10636 3/20 0.47
NPSR1 Q6W5P4 1/20 0.46
LMNA P02545 3/20 0.45
KDM4E B2RXH2 2/20 0.45
L3MBTL1 Q9Y468 3/20 0.45
ADORA3 P0DMS8 1/20 0.45
HPGD P15428 1/20 0.45
XBP1 P17861 1/20 0.45
MAOA P21397 1/20 0.45
MAOB P27338 1/20 0.45
CTDSP1 Q9GZU7 1/20 0.45
NPC1 O15118 3/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
CA12 O43570 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1087134 0.94 MEN1 (0.58) MEN1KMT2ARAB9AGLATDP1
Methacrylic Acid SCHEMBL600293 0.94 RAB9A (0.49) MEN1KMT2ARAB9AGLATDP1
SCHEMBL1087500 0.91 RAB9A (0.51) MEN1KMT2ARAB9AGLATDP1
Maleic Acid SCHEMBL17504861 0.90 MEN1 (0.54) MEN1KMT2ARAB9AGLATDP1
Trimethylammonium SCHEMBL7775399 0.89 MEN1 (0.53) MEN1KMT2ARAB9AGLATDP1
Acrylic Acid SCHEMBL5994377 0.89 MEN1 (0.53) MEN1KMT2ARAB9AGLATDP1
Methacrylic Acid SCHEMBL15376306 0.88 KDM4E (0.44) MEN1KMT2ARAB9ATDP1ALDH1A1
Itaconate SCHEMBL11309982 0.87 MEN1 (0.48) MEN1KMT2ARAB9AALDH1A1MAPT
SCHEMBL11341483 0.87 MEN1 (0.48) MEN1KMT2ARAB9AGLATDP1
Methacrylic Acid SCHEMBL390016 0.87 KDM4E (0.49) RAB9AGLATDP1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102859068-B Use of a latex of styrene particles having a size of 100nm as a rheological agent in a coating liquid for papermaking, coating liquid and process for obtaining paper coated with the coating liquid COATEX S.A.S. (FR) 2015-10-21 CN disclosed
US-8790491-B2 Use of a styrene latex 100 nm in size as a rheological agent in a paper coating, the paper coating, and the method for obtaining it COATEX (FR) 2014-07-29 US disclosed
CN-102859068-A Use of a latex of styrene particles having a size of 100nm as a rheological agent in a coating liquid for papermaking, coating liquid and process for obtaining paper coated with the coating liquid COATEX SAS 2013-01-02 CN disclosed
US-8101339-B2 Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-01-24 US disclosed
US-20110251307-A1 USE OF A STYRENE LATEX 100 NM IN SIZE AS A RHEOLOGICAL AGENT IN A PAPER COATING, THE PAPER COATING, AND THE METHOD FOR OBTAINING IT COATEX S.A.S. (FR) 2011-10-13 US disclosed
US-20090317746-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-12-24 US disclosed