Methacrylic Acid

Methacrylic Acid

SCHEMBL600293

C=C(C)C(=O)O.C=C(C)C(=O)OC.C=C(C=Cc1ccccc1)C(=O)OCC

nearest known ligand 0.49

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.49
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
MAPT P10636 3/20 0.44
NPSR1 Q6W5P4 1/20 0.44
LMNA P02545 2/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
NPC1 O15118 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
ALDH1A1 P00352 6/20 0.44
KDM4E B2RXH2 2/20 0.44
ADORA3 P0DMS8 2/20 0.43
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA9 Q16790 1/20 0.42
GLA P06280 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
HAO1 Q9UJM8 1/20 0.41
EGFR P00533 2/20 0.41
HPGD P15428 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1087500 0.97 RAB9A (0.51) RAB9AMEN1KMT2AMAPTNPSR1
Methacrylic Acid SCHEMBL390857 0.94 MEN1 (0.53) RAB9AMEN1KMT2AMAPTNPSR1
SCHEMBL1087134 0.88 MEN1 (0.58) RAB9AMEN1KMT2AMAPTNPSR1
SCHEMBL3141759 0.87 GLA (0.51) MEN1KMT2AMAPTLMNASMN1; SMN2
Methacrylic Acid SCHEMBL5902071 0.87 ALDH1A1 (0.53) RAB9AMEN1KMT2AMAPTLMNA
SCHEMBL5075286 0.85 KDM4E (0.44) RAB9AMEN1KMT2AMAPTNPSR1
SCHEMBL464928 0.85 TDP1 (0.50) RAB9AKMT2AL3MBTL1SMN1; SMN2KDM4E
Maleic Acid SCHEMBL17504861 0.84 MEN1 (0.54) RAB9AMEN1KMT2AMAPTNPSR1
SCHEMBL11358273 0.84 RAB9A (0.44) RAB9AMEN1KMT2AMAPTNPSR1
Itaconate SCHEMBL11309982 0.84 MEN1 (0.48) RAB9AMEN1KMT2AMAPTNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105593950-A Photosensitive conductive film, conductive pattern formation method using same, and conductive pattern substrate HITACHI CHEMICAL CO LTD 2016-05-18 CN disclosed
EP-2284611-B1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN MANUFACTURING METHOD, AND PRINTED CIRCUIT BOARD MANUFACTURING METHOD HITACHI CHEMICAL CO LTD (JP) 2013-11-20 EP disclosed
US-20120040290-A1 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-02-16 US disclosed
EP-2284611-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN MANUFACTURING METHOD, AND PRINTED CIRCUIT BOARD MANUFACTURING METHOD Hitachi Chemical Company, Ltd. (JP) 2011-02-16 EP disclosed
CN-101297242-A Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board HITACHI CHEMICAL CO LTD (JP) 2008-10-29 CN disclosed