SCHEMBL391072

SCHEMBL391072

CN(C)c1ccc(C=C(C(=O)C(=Cc2ccc(N(C)C)cc2)c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.61
KMT2A Q03164 6/20 0.61
ALDH1A1 P00352 5/20 0.61
LMNA P02545 1/20 0.61
GAA P10253 1/20 0.61
MEN1 O00255 2/20 0.58
RAB9A P51151 6/20 0.56
MAPK1 P28482 1/20 0.56
L3MBTL1 Q9Y468 1/20 0.56
NPC1 O15118 4/20 0.56
HPGD P15428 1/20 0.56
AKR1C1 Q04828 3/20 0.53
SMN1; SMN2 Q16637 3/20 0.52
PKM P14618 1/20 0.52
AKR1C2 P52895 2/20 0.50
RELA Q04206 1/20 0.50
AKR1C3 P42330 1/20 0.50
CASP3 P42574 1/20 0.50
CYP1B1 Q16678 1/20 0.50
SENP8 Q96LD8 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL391070 0.93 MAPT (0.58) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL11154797 0.91 MAPT (0.53) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL14964849 0.90 AKR1C1 (0.68) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL14964850 0.90 AKR1C1 (0.68) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL14970313 0.86 MAPT (0.57) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL392760 0.85 ALDH1A1 (0.54) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL14970302 0.82 KMT2A (0.55) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL28065921 0.82 AKR1C1 (0.76) MAPTKMT2AALDH1A1LMNAMEN1
SCHEMBL9317348 0.79 ALDH1A1 (0.63) MAPTKMT2AALDH1A1LMNAGAA
SCHEMBL5145449 0.78 MAPT (0.67) MAPTKMT2AALDH1A1LMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US claimed
EP-2085821-B1 Dye-containing negative curable composition, color filter and method of producing color filter FUJIFILM CORP (JP) 2016-06-01 EP disclosed
EP-2275495-B1 CURABLE COMPOSITION COMPRISING A METAL PHTHALOCYANINE DYE MIXTURE, COLOR FILTER, AND METHOD FOR PRODUCING COLOR FILTER FUJIFILM CORP (JP) 2016-04-27 EP disclosed
EP-1965255-B1 Color filter and method for making the color filter FUJIFILM CORP (JP) 2015-08-12 EP disclosed
US-8968973-B2 Color filter and production method thereof, and solid-state image sensor using the same FUJIFILM CORPORATION (JP) 2015-03-03 US disclosed
US-8895909-B2 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor FUJIFILM CORPORATION (JP) 2014-11-25 US disclosed
US-8872099-B2 Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter FUJIFILM CORPORATION (JP) 2014-10-28 US disclosed
EP-2348361-B1 NEGATIVE-TYPE DYE-CONTAINING CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCTION THEREOF BOTH UTILIZING THE COMPOSITION, AND SOLID IMAGING ELEMENT FUJIFILM CORP (JP) 2014-06-25 EP disclosed
US-8614037-B2 Dye-containing negative working curable composition, color filter and method of producing thereof FUJIFILM CORPORATION (JP) 2013-12-24 US disclosed
US-8603708-B2 Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device FUJIFILM CORPORATION (JP) 2013-12-10 US disclosed
EP-0591786-B1 Photosensitive composition FUJI PHOTO FILM CO LTD (JP) 1996-05-15 EP disclosed
EP-0672951-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-20 EP disclosed
EP-0591786-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1994-04-13 EP disclosed
US-5212307-A LIGHT-SENSITIVE BIS-TRICHLOROMETHYL-S-TRIAZINES, AND PROCESS FOR THEIR PREPARATION HOECHST AKTIENGESELLSCHAFT (DE) 1993-05-18 US disclosed
US-5061605-A IMPROVED SENSITIVITY TO LONG WAVELENGTHS FUJI PHOTO FILM CO., LTD. (JP) 1991-10-29 US disclosed
US-4837128-A UNSATURATED COMPOUND AND TRIAZINE FREE RADICAL GENERATOR FUJI PHOTO FILM CO., LTD. (JP) 1989-06-06 US disclosed
US-4701399-A Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole FUJI PHOTO FILM CO., LTD. (JP) 1987-10-20 US disclosed
US-4504573-A QUINAZOLINONE INITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1985-03-12 US disclosed
US-4367280-A AROMATIC CARBONYL COMPOUND AND P-DIALKYLAMINO AROMATIC CARBONYL COMPOUND COMBINATION POLYMERIZATION INITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1983-01-04 US disclosed
US-4258121-A SULFONYLOXY N-SUBSTITUTED IMIDES AS PHOTOINITIATORS FUJI PHOTO FILM CO., LTD. (JP) 1981-03-24 US disclosed