⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL234038 | 0.71 | TSHR (0.32) | — | |
| SCHEMBL9615160 | 0.68 | TSHR (0.30) | — | |
| SCHEMBL30633433 | 0.68 | TSHR (0.38) | — | |
| SCHEMBL22309795 | 0.67 | CA2 (0.33) | — | |
| SCHEMBL12796245 | 0.66 | — | — | |
| SCHEMBL2400356 | 0.65 | — | — | |
| SCHEMBL30149349 | 0.65 | TSHR (0.44) | — | |
| SCHEMBL24811508 | 0.64 | — | — | |
| SCHEMBL10292594 | 0.64 | ALDH1A1 (0.31) | — | |
| SCHEMBL9957780 | 0.63 | CTSV (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11492432-B2 | Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2022-11-08 | — | — | US | disclosed |
| US-7566156-B2 | Method of manufacturing backlight unit, backlight unit, electrooptical device and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2009-07-28 | — | — | US | disclosed |
| US-7375893-B2 | Method of manufacturing microlens, microlens, optical film, screen for projection, projector system, electrooptical device and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060291239-A1 | METHOD OF MANUFACTURING BACKLIGHT UNIT, BACKLIGHT UNIT, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20060262410-A1 | METHOD OF MANUFACTURING MICROLENS, MICROLENS, OPTICAL FILM, SCREEN FOR PROJECTION, PROJECTOR SYSTEM, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |