SCHEMBL3914142

SCHEMBL3914142

COC(=O)c1cc2cc(C(=O)O)ccc2cc1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.54
PTPN11 Q06124 3/20 0.50
LCK P06239 2/20 0.48
CA12 O43570 3/20 0.47
CA1 P00915 3/20 0.47
CA2 P00918 3/20 0.47
CA7 P43166 3/20 0.47
CA9 Q16790 3/20 0.47
CA14 Q9ULX7 3/20 0.47
PDK2 Q15119 1/20 0.47
PDK4 Q16654 1/20 0.47
HTT P42858 2/20 0.46
GAA P10253 1/20 0.45
XDH P47989 1/20 0.45
RARB P10826 1/20 0.44
RARG P13631 1/20 0.44
MPL P40238 1/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
ALDH1A1 P00352 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL3915156 0.98 KDM4E (0.53) KDM4EPTPN11LCKCA12CA1
SCHEMBL6294366 0.90 LCK (0.58) KDM4EPTPN11LCKCA12CA1
SCHEMBL3917252 0.88 PTPN11 (0.60) KDM4EPTPN11LCKCA12CA1
SCHEMBL3915151 0.86 LCK (0.47) KDM4EPTPN11LCKCA12CA1
SCHEMBL3917214 0.86 LCK (0.65) KDM4EPTPN11LCKCA12CA1
Hydrochloric Acid SCHEMBL3914484 0.86 PTPN11 (0.59) KDM4EPTPN11LCKCA12CA1
SCHEMBL3914443 0.84 HRH3 (0.52) KDM4EPTPN11CA12CA1CA2
SCHEMBL29812614 0.83 LCK (0.53) KDM4EPTPN11LCKCA12CA1
SCHEMBL30570062 0.83 LCK (0.53) KDM4EPTPN11LCKCA12CA1
SCHEMBL5541003 0.83 LCK (0.53) KDM4EPTPN11LCKCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7531691-B2 Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2009-05-12 US disclosed
US-20080045720-A1 Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICALS INDUSTRY, LTD. (JP) 2008-02-21 US disclosed
EP-1867629-A2 Method for producing naphthalene carboxylic acid amide compound Ueno Fine Chemicals Industry, Ltd. (JP) 2007-12-19 EP disclosed
CN-101088987-A Method for producing naphthalene carboxylic acid amide compound UENO FINE CHEMICAL IND (JP) 2007-12-19 CN disclosed
US-7169523-B2 electrophotographic toners comprising binder resins, colorants and charge control agents consisting of naphthol derivatives, having excellent negative chargeability, dispersion in and compatibility with binders KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2007-01-30 US disclosed
CN-1860096-A Aminocarbonyl naphthol derivative, cyanonaphthol derivative and preparation method thereof UENO SEIYAKU OYO KENKYUJO KK (JP) 2006-11-08 CN disclosed
US-20060231589-A1 Hydroxynaphthalenedicarboxylic acid hydrazide and derivatives thereof as well as process for preparing them KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO 2006-10-19 US disclosed
EP-1712546-A1 Hydroxynaphthalenedicarboxylic acid hydrazide and derivatives thereof as well as process for preparing them KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2006-10-18 EP disclosed
US-20060205952-A1 Aminocarbonyl naphthol derivative, cyanonaphthol derivative, and method for producing them KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2006-09-14 US disclosed
EP-1048694-B1 AZO COMPOUNDS AND PROCESS FOR PRODUCING THE SAME UENO SEIYAKU OYO KENKYUJO KK (JP) 2006-06-07 EP disclosed
US-20020151720-A1 NAPHTHOL DERIVATIVES KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2002-10-17 US disclosed
US-6451988-B1 AN AZO COMPOUND AND A METAL COMPLEX WHICH ARE SYNTHESIZED WITH THE NAPHTHOL DERIVATIVE KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2002-09-17 US disclosed
US-6409812-B1 MONOAZO DYE; PAINTS, INK JETS, COLOR FILTERS; ELECTROGRAPHY; DIAZOTIZATION KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2002-06-25 US disclosed
US-6388045-B1 CARBOXYLATED AROMATIC COMPOUND KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2002-05-14 US disclosed
EP-1103573-A1 LIQUID-CRYSTAL POLYMER KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2001-05-30 EP disclosed
CN-1291215-A Toning agent UENO SEIYAKU OYO KENKYUJO KK (JP) 2001-04-11 CN disclosed
EP-1048694-A1 AZO COMPOUNDS AND PROCESS FOR PRODUCING THE SAME KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2000-11-02 EP disclosed
EP-1043364-A1 TONING AGENT KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2000-10-11 EP disclosed
US-6005085-A NOVEL CONDENSED AZO COMPOUNDS USING BISAMIDE COMPOUNDS OF 2-HYDROXYNAPHTHALENE-3,6-DICARBOXYLIC ACID, AMIDE, OR ESTER AS THE COUPLERS, WHICH HAVE EXCELLENT PROPERTIES SUCH AS EXCELLENT WATER RESISTANCE, CHEMICAL RESISTANCE, SOLVENT KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1999-12-21 US disclosed
EP-0913430-A1 CONDENSED AZO COMPOUND AND PROCESS FOR PRODUCING THE SAME KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1999-05-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020151720-A1 NAPHTHOL DERIVATIVES NAP1L1, IK, NAP1L4 KDM4E 3584/4885PTPN11 1039/4885LCK 1281/4885
US-20060205952-A1 Aminocarbonyl naphthol derivative, cyanonaphthol derivative, and method for producing them HCCS, CYP8B1, NCAPD3 KDM4E 1918/4885PTPN11 2939/4885LCK 3212/4885
US-20080045720-A1 Method for producing naphthalene carboxylic acid amide compound NAAA, AADAC, NAT1 KDM4E 2012/4885PTPN11 2986/4885LCK 4052/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.