Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | RARG | P13631 | 2/20 | 0.32 |
| ▸ | RXRA | P19793 | 2/20 | 0.32 |
| ▸ | PPARG | P37231 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | PTAFR | P25105 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6472692 | 0.94 | TSHR (0.36) | KMT2ASMN1; SMN2ALDH1A1RXRAPPARG | |
| SCHEMBL6386501 | 0.93 | MAPT (0.33) | MEN1KMT2ASMN1; SMN2RARGRXRA | |
| SCHEMBL29771328 | 0.88 | MEN1 (0.36) | MEN1KMT2AALDH1A1MAPTTSHR | |
| SCHEMBL29114642 | 0.88 | MEN1 (0.36) | MEN1KMT2AALDH1A1MAPTTSHR | |
| SCHEMBL65695 | 0.88 | MEN1 (0.36) | MEN1KMT2AALDH1A1MAPTTSHR | |
| SCHEMBL305556 | 0.87 | TSHR (0.40) | MEN1KMT2ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL23149337 | 0.84 | MEN1 (0.33) | MEN1KMT2A | |
| SCHEMBL15158116 | 0.82 | TSHR (0.37) | MEN1KMT2ASMN1; SMN2ALDH1A1MAPT | |
| SCHEMBL11136817 | 0.82 | THRB (0.37) | MEN1KMT2ASMN1; SMN2ALDH1A1RARG | |
| SCHEMBL27125372 | 0.82 | CA9 (0.34) | MEN1KMT2ASMN1; SMN2ALDH1A1RARG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2565037-B1 | Process for producing flexographic printing plate precursor for laser engraving, and process for making flexographic printing plate | FUJIFILM CORP (JP) | 2014-10-01 | — | — | EP | disclosed |
| EP-2284611-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, RESIST PATTERN MANUFACTURING METHOD, AND PRINTED CIRCUIT BOARD MANUFACTURING METHOD | HITACHI CHEMICAL CO LTD (JP) | 2013-11-20 | — | — | EP | disclosed |
| EP-2492093-B1 | Relief printing plate precursor for laser engraving and process for producing a relief printing plate | FUJIFILM CORP (JP) | 2013-08-28 | — | — | EP | disclosed |
| US-8501392-B2 | Photosensitive element, method for formation of resist pattern, and method for production of print circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8460853-B2 | Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-06-11 | — | — | US | disclosed |
| US-8460852-B2 | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-06-11 | — | — | US | disclosed |
| EP-2565037-A1 | Process for producing flexographic printing plate precursor for laser engraving, and process for making flexographic printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-8389204-B2 | Method for producing comb-shaped electrode | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20130049264-A1 | PROCESS FOR PRODUCING FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR MAKING FLEXOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-2492093-A2 | Relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same | Fujifilm Corporation (JP) | 2012-08-29 | — | — | EP | disclosed |
| US-20060051698-A1 | Photosensitive resin composition and photosensitive element employing using the same | MIYOSHI HIROKO | 2006-03-09 | — | — | US | disclosed |
| EP-1569213-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 2005-08-31 | — | — | EP | disclosed |
| WO-2005016983-A1 | COATING SYSTEM CONTAINING (METH)ACRYLATE | SIKA TECHNOLOGY AG (CH) | 2005-02-24 | — | — | WO | disclosed |
| US-20040112859-A1 | Photosensitive film for circuit formation and process for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2004-06-17 | — | — | US | disclosed |
| EP-0769038-B1 | SYNTHETIC MORTAR RESIN COMPOSITIONS | CRAY VALLEY SA (FR) | 1998-03-04 | — | — | EP | disclosed |
| US-5300536-A | Vinyl compound capable of free radical polymerization | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-04-05 | — | — | US | disclosed |
| US-4394494-A | DIURETHANE TETRAACRYLATES AS POLYMERIZABLE MONOMERS | LION CORPORATION (JP) | 1983-07-19 | — | — | US | disclosed |
| US-4388421-A | PRIMERS | LION CORPORATION (JP) | 1983-06-14 | — | — | US | disclosed |
| US-4383052-A | 1-Methacryloxyethane-1,1-diphosphonic acid and its salts and dental adhesive composition containing same | LION CORPORATION (JP) | 1983-05-10 | — | — | US | disclosed |
| US-4055542-A | PEROXIDE | THREE BOND CO., LTD. (JA) | 1977-10-25 | — | — | US | disclosed |