SCHEMBL393358

SCHEMBL393358

C=C(C)C(=O)OC(C)(C)CC=Cc1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAM P19021 1/20 0.42
MMP1 P03956 1/20 0.41
MMP9 P14780 1/20 0.41
MMP13 P45452 1/20 0.41
GLA P06280 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CYP2C19 P33261 1/20 0.39
EGFR P00533 1/20 0.38
PPARA Q07869 1/20 0.37
MAOB P27338 1/20 0.37
KMT2A Q03164 2/20 0.36
ELANE P08246 1/20 0.36
HSP90AA1 P07900 2/20 0.36
HSP90AB1 P08238 2/20 0.36
NPC1 O15118 2/20 0.36
IDO1 P14902 1/20 0.36
CACNA1B Q00975 1/20 0.36
POLB P06746 1/20 0.36
MEN1 O00255 1/20 0.36
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3792651 0.87 PAM (0.41) PAMMMP1MMP9MMP13GLA
SCHEMBL2475225 0.87 CA12 (0.39) MMP9MMP13MAOB
SCHEMBL7986427 0.84 MMP1 (0.43) PAMMMP1MMP9MMP13GLA
SCHEMBL8752364 0.84 PPARA (0.35) MMP1MMP9MMP13PPARAKMT2A
Styrene SCHEMBL31474472 0.77 ALDH1A1 (0.40) GLATDP1CYP2C19PPARAKMT2A
SCHEMBL3798531 0.77 CYP2C19 (0.47) PAMGLATDP1CYP2C19EGFR
SCHEMBL6858824 0.77 GLA (0.42) GLATDP1CYP2C19EGFRPPARA
SCHEMBL75626 0.76 CACNA1B (0.50) PAMMMP1MMP9GLATDP1
SCHEMBL3468078 0.76 CACNA1B (0.50) PAMMMP1MMP9GLATDP1
SCHEMBL75625 0.76 CACNA1B (0.50) PAMMMP1MMP9GLATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9557639-B2 Method of patterning block copolymer layer and patterned structure SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-01-31 US disclosed
EP-1551885-B1 PROCESS TO MODIFY POLYMERIC MATERIALS 3M INNOVATIVE PROPERTIES CO (US) 2016-02-17 EP disclosed
US-20140193614-A1 METHOD OF PATTERNING BLOCK COPOLYMER LAYER AND PATTERNED STRUCTURE Yonsei University, University - Industry Foundation(UIF) (KR) 2014-07-10 US disclosed
US-8101711-B2 Process to modify polymeric materials and resulting compositions 3M INNOVATIVE PROPERTIES COMPANY (US) 2012-01-24 US disclosed
US-20100068643-A1 ELECTROSTATIC-IMAGE-DEVELOPING TONER, PROCESS FOR PRODUCING ELECTROSTATIC-IMAGE-DEVELOPING TONER, ELECTROSTATIC IMAGE DEVELOPER, AND IMAGE-FORMING APPARATUS FUJI XEROX CO., LTD. (JP) 2010-03-18 US disclosed
US-20100048819-A1 PROCESS TO MODIFY POLYMERIC MATERIALS AND RESULTING COMPOSITIONS 3M INNOVATIVE PROPERTIES COMPANY 2010-02-25 US disclosed
US-7632916-B2 Thermally induced graft polymerization in an apparatus by shearing, devolatilization; grafting isoprene-t-butyl methacrylate copolymer with polyoxyethylene glycol methyl ether, forming methacrylic acid/anhydride monomers 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-12-15 US disclosed
US-7514263-B2 Continuous process for the production of combinatorial libraries of materials 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-04-07 US disclosed
EP-1379329-B1 A CONTINUOUS PROCESS FOR THE PRODUCTION OF COMBINATORIAL LIBRARIES OF MATERIALS 3M INNOVATIVE PROPERTIES CO (US) 2008-07-09 EP disclosed
US-20070122915-A1 Continuous process for the production of combinatorial libraries of modified materials 3M INNOVATIVE PROPETIES COMPANY 2007-05-31 US disclosed
WO-2004012858-A1 A CONTINUOUS PROCESS FOR THE PRODUCTION OF COMBINATORIAL LIBRARIES OF MODIFIED MATERIALS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-02-12 WO disclosed
WO-2004013189-A2 PROCESS TO MODIFY POLYMERIC MATERIALS AND RESULTING COMPOSITIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-02-12 WO disclosed
US-20040023398-A1 Continuous process for the production of combinatorial libraries of modified materials 3M INNOVATIVE PROPERTIES COMPANY 2004-02-05 US disclosed
US-20040024130-A1 Process to modify polymeric materials and resulting compositions 3M INNOVATIVE PROPERTIES COMPANY 2004-02-05 US disclosed
EP-1379329-A2 A CONTINUOUS PROCESS FOR THE PRODUCTION OF COMBINATORIAL LIBRARIES OF MATERIALS 3M Innovative Properties Company (US) 2004-01-14 EP disclosed
US-20030035756-A1 Continuous process for the production of combinatorial libraries of materials 3M INNOVATIVE PROPERTIES COMPANY 2003-02-20 US disclosed
EP-1263794-A1 CONTINUOUS PROCESS FOR THE PRODUCTION OF CONTROLLED ARCHITECTURE MATERIALS 3M Innovative Properties Company (US) 2002-12-11 EP disclosed
WO-2002081079-A2 A CONTINUOUS PROCESS FOR THE PRODUCTION OF COMBINATORIAL LIBRARIES OF MATERIALS 3M INNOVATIVE PROPERTIES COMPANY (US) 2002-10-17 WO disclosed
US-6448353-B1 ANIONIC SOLUTION POLYMERIZATION OF TEMPERATURE SENSITIVE MONOMERS UNDER PLUG FLOW AND TEMPERATURE CONTROLLED CONDITIONS; MINIMIZING SIDE REACTIONS; NARROW POLYDISPERSITY; TAILORING FOR SPECIFIC APPLICATIONS 3M INNOVATIVE PROPERTIES COMPANY 2002-09-10 US disclosed
WO-2001058962-A1 CONTINUOUS PROCESS FOR THE PRODUCTION OF CONTROLLED ARCHITECTURE MATERIALS 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-08-16 WO disclosed