Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | GLA | P06280 | 1/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.51 |
| ▸ | TP53 | P04637 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
| ▸ | ADRA1D | P25100 | 3/20 | 0.42 |
| ▸ | ADRA1A | P35348 | 3/20 | 0.42 |
| ▸ | ADRA1B | P35368 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.39 |
| ▸ | HTR7 | P34969 | 1/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14352862 | 0.91 | TDP1 (0.58) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL29422796 | 0.89 | ALDH1A1 (0.64) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL18812749 | 0.89 | ALDH1A1 (0.59) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL623648 | 0.89 | ALDH1A1 (0.64) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL8993129 | 0.89 | ALDH1A1 (0.64) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL18812756 | 0.88 | TDP1 (0.53) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL232485 | 0.88 | TDP1 (0.51) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL18812774 | 0.88 | ALDH1A1 (0.58) | ALDH1A1GLATDP1TP53CYP3A4 | |
| Water SCHEMBL22325690 | 0.87 | ALDH1A1 (0.62) | ALDH1A1GLATDP1TP53CYP3A4 | |
| SCHEMBL14389755 | 0.86 | ALDH1A1 (0.48) | ALDH1A1GLATDP1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112920679-A | Anticorrosive paint and preparation method and application thereof | 南京工业大学 | 2021-06-08 | — | — | CN | claimed |
| CN-106832782-A | A kind of laminal filter particle/polymer composite and preparation method thereof | 深圳先进技术研究院 | 2017-06-13 | — | — | CN | claimed |
| CN-101260224-B | Method for modifying bisphenol A epoxy resin by using liquid crystal epoxy resin | UNIV HEBEI TECHNOLOGY | 2010-08-18 | — | — | CN | claimed |
| CN-101260224-A | Method for modifying bisphenol A epoxy resin by using liquid crystal epoxy resin | UNIV HEBEI TECHNOLOGY (CN) | 2008-09-10 | — | — | CN | claimed |
| CN-1601267-A | Micro array and prepn, method of micro double-band electrodes | CHANGCHUN APPLIED CHEMISTRY (CN) | 2005-03-30 | — | — | CN | claimed |
| CN-1601266-A | Method for fabricating electrochemical working-electrode | CHANGCHUN APPLIED CHEMISTRY (CN) | 2005-03-30 | — | — | CN | claimed |
| US-12559623-B2 | Resin composition and electromagnetic wave absorber | MITSUBISHI CHEMICAL CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-20260029716-A1 | POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM COMPRISING SAME | DONGJIN SEMICHEM CO LTD (KR) | 2026-01-29 | — | — | US | disclosed |
| US-12241200-B2 | Sizing agent composition for fibers, fiber bundle, fiber product and composite material | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2025-03-04 | — | — | US | disclosed |
| US-20240218162-A1 | RESIN COMPOSITION, PELLET AND MOLDED ARTICLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| WO-2024128647-A1 | POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING SAME | 주식회사 동진쎄미켐 | 2024-06-20 | — | — | WO | disclosed |
| CN-114746471-B | Hardener for epoxy casting resins | SIKA技术股份公司 | 2024-04-16 | — | — | CN | disclosed |
| CN-115038753-B | Composition, curable composition, cured product, and storage method | 株式会社钟化 | 2024-03-19 | — | — | CN | disclosed |
| EP-1283236-A1 | RESIN DISPERSIONS HAVING UNIFORM PARTICLE DIAMETERS, RESIN PARTICLES AND PROCESSES FOR PRODUCING BOTH | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2003-02-12 | — | — | EP | disclosed |
| US-6495653-B1 | RETAINING CURABILITY EVEN AT A LOW TEMPERATURES, LOW VISCOSITY, RAPID CURE | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2002-12-17 | — | — | US | disclosed |
| US-6090870-A | ORTHO-BIPHENYL EPOXY RESIN. | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2000-07-18 | — | — | US | disclosed |
| US-5945501-A | Epoxy resin compositions including novel phenol novolak condensates produced from bis(methoxymethyl)biphenyls | UBE INDUSTRIES, LTD. (JP) | 1999-08-31 | — | — | US | disclosed |
| US-5641997-A | Plastic-encapsulated semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1997-06-24 | — | — | US | disclosed |
| US-5612442-A | Phenol novolak condensate and bis(methoxymethyl)biphenyl for production thereof | UBE INDUSTRIES, LTD. (JP) | 1997-03-18 | — | — | US | disclosed |
| EP-0384707-A2 | Semiconductor device encapsulating epoxy resin composition | TORAY INDUSTRIES, INC. (JP) | 1990-08-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12559623-B2 | Resin composition and electromagnetic wave absorber | TERB1, LBR, TEX10 | ALDH1A1 2805/4885GLA 3575/4885TDP1 1052/4885 |
| US-20260029716-A1 | POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM COMPRISING SAME | RIF1, MACF1, ARF1 | ALDH1A1 3080/4885GLA 3339/4885TDP1 2526/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.