⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8647229 | 0.79 | — | — | |
| SCHEMBL9014288 | 0.78 | — | — | |
| SCHEMBL17979634 | 0.73 | ALDH1A1 (0.35) | — | |
| SCHEMBL197051 | 0.66 | TSHR (0.32) | — | |
| SCHEMBL8578958 | 0.66 | ALDH1A1 (0.35) | — | |
| SCHEMBL5162219 | 0.66 | MEN1 (0.33) | — | |
| SCHEMBL11597634 | 0.64 | MEN1 (0.32) | — | |
| SCHEMBL9074850 | 0.63 | — | — | |
| SCHEMBL9972956 | 0.60 | CA12 (0.31) | — | |
| SCHEMBL9075821 | 0.60 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 916 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024036679-A1 | ANTI-REFLECTIVE COATING COMPOSITION | 嘉庚创新实验室 | 2024-02-22 | — | — | WO | claimed |
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | claimed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | claimed |
| CN-115403976-B | Anti-reflection coating composition | 嘉庚创新实验室 | 2023-04-18 | — | — | CN | claimed |
| US-11586109-B2 | Chemically-amplified-type negative-type photoresist composition | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-02-21 | — | — | US | claimed |
| CN-115403976-A | Anti-reflection coating composition | 嘉庚创新实验室 | 2022-11-29 | — | — | CN | claimed |
| US-20220172955-A1 | NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2022-06-02 | — | — | US | claimed |
| EP-3435160-B1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YOUNG CHANG CHEMICAL CO LTD (KR) | 2022-05-04 | — | — | EP | claimed |
| EP-3940747-A1 | NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS | Young Chang Chemical Co., Ltd. (KR) | 2022-01-19 | — | — | EP | claimed |
| CN-112805333-A | Coating with improved scratch resistance | 伊士曼化工公司 | 2021-05-14 | — | — | CN | claimed |
| WO-1993003063-A1 | CELLULOSE ACETOACETATES | EASTMAN CHEMICAL COMPANY (US) | 1993-02-18 | — | — | WO | claimed |
| WO-1992014694-A1 | THERMOSETTING COATING COMPOSITIONS | EASTMAN KODAK COMPANY (US) | 1992-09-03 | — | — | WO | claimed |
| US-5144003-A | Curable copolymers containing 1,5-bis(4-carboxycyclohexyl)-3-pentanol monomer; castings and moldings | EASTMAN KODAK COMPANY (US) | 1992-09-01 | — | — | US | claimed |
| EP-0409916-A1 | WATER-DISSIPATABLE POLYESTER RESINS AND COATINGS PREPARED THEREFROM | EASTMAN KODAK COMPANY (US) | 1991-01-30 | — | — | EP | claimed |
| US-4973656-A | BRANCHED, CONTAINING SULFONATE GROUPS | EASTMAN KODAK COMPANY (US) | 1990-11-27 | — | — | US | claimed |
| WO-1990003994-A2 | WATER-DISSIPATABLE POLYESTER RESINS AND COATINGS PREPARED THEREFROM | EASTMAN KODAK COMPANY (US) | 1990-04-19 | — | — | WO | claimed |
| EP-0364331-A2 | Water-dissipatable polyester resins and coatings prepared therefrom | EASTMAN CHEMICAL COMPANY (US) | 1990-04-18 | — | — | EP | claimed |
| EP-0008156-B1 | PRODUCTION OF POLYMER MICROPARTICLES AND COATING COMPOSITIONS CONTAINING THEM | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1984-03-14 | — | — | EP | claimed |
| US-4340511-A | AMINO RESIN CROSSLINKED ADDITION POLYMER | IMPERIAL CHEMICAL INDUSTRIES LIMITED (GB) | 1982-07-20 | — | — | US | claimed |
| EP-0008156-A1 | Production of polymer microparticles and coating compositions containing them | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1980-02-20 | — | — | EP | claimed |