⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL394202 | 0.79 | — | — | |
| SCHEMBL8953934 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL9014288 | 0.62 | — | — | |
| SCHEMBL5270518 | 0.60 | — | — | |
| SCHEMBL2210059 | 0.60 | ALDH1A1 (0.43) | — | |
| SCHEMBL17979634 | 0.59 | ALDH1A1 (0.35) | — | |
| SCHEMBL5270519 | 0.59 | ALDH1A1 (0.32) | — | |
| SCHEMBL197051 | 0.59 | TSHR (0.32) | — | |
| SCHEMBL14941932 | 0.58 | TP53 (0.31) | — | |
| SCHEMBL3808514 | 0.58 | ALOX15 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0458325-B1 | Negative photosensitive composition and method for forming a resist pattern | MITSUBISHI CHEM CORP (JP) | 1998-08-19 | — | — | EP | disclosed |
| EP-0458325-A1 | Negative photosensitive composition and method for forming a resist pattern | Mitsubishi Chemical Corporation (JP) | 1991-11-27 | — | — | EP | disclosed |