SCHEMBL394229

SCHEMBL394229

Cc1ccc(C)c(S)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29438518 1.00
SCHEMBL7735443 0.97 TDP1 (0.46)
SCHEMBL9231006 0.88 ALDH1A1 (0.39)
SCHEMBL7054879 0.82 ALDH1A1 (0.35)
SCHEMBL29373274 0.79
SCHEMBL331198 0.79
Hydrochloric Acid SCHEMBL31606798 0.77 CYP2A6 (0.43)
SCHEMBL63648 0.77
SCHEMBL234687 0.77
SCHEMBL28693453 0.77 CYP2A6 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12365834-B2 Method of substituting ligands SHARP KABUSHIKI KAISHA (JP) 2025-07-22 US claimed
US-20240343971-A1 METHOD OF SUBSTITUTING LIGANDS SHARP KABUSHIKI KAISHA (JP) 2024-10-17 US claimed
US-12084457-B2 Methods for the preparation of 1,3-benzodioxole heterocyclic compounds UNION therapeutics A/S (DK) 2024-09-10 US claimed
CN-118209645-A Method for detecting 2, 4-dimethylbenzene thiophenol related substances 重庆药友制药有限责任公司 2024-06-18 CN claimed
CN-117586304-A Aryl phosphonate and aryl thiophosphonate compound and preparation method thereof 烟台大学 2024-02-23 CN claimed
CN-117581636-A Nanoparticle film patterning method, light-emitting element manufacturing method, display device manufacturing method, and light-emitting element 夏普株式会社 2024-02-20 CN claimed
WO-2023053312-A1 LIGAND SUBSTITUTION METHOD シャープ株式会社 2023-04-06 WO claimed
WO-2023053311-A1 NANOPARTICLE FILM PATTERNING METHOD, METHOD FOR PRODUCING LIGHT-EMITTING ELEMENT, METHOD FOR PRODUCING DISPLAY DEVICE, AND LIGHT-EMITTING ELEMENT シャープ株式会社 2023-04-06 WO claimed
CN-114815507-A Low-odor photosensitive resin composition for photosensitive dry film 江西惠美兴科技有限公司 2022-07-29 CN claimed
CN-113741147-A Photoresist with high resolution and excellent adhesion 深圳惠美亚科技有限公司 2021-12-03 CN claimed
US-7537974-B2 Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-05-26 US claimed
WO-2008131206-A1 METALLIC SURFACE ENHANCEMENT ENTHONE INC. (US) 2008-10-30 WO claimed
US-20060188808-A1 Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same SAMSUNG DISPLAY CO., LTD. (KR) 2006-08-24 US claimed
EP-1330477-A2 RHEOLOGY MODIFYING COPOLYMER COMPOSITION Noveon IP Holdings Corp. (US) 2003-07-30 EP claimed
US-20030082101-A1 Accelerators for increasing the rate of formation of free radicals and reactive oxygen species CAVALIER DISCOVERY 2003-05-01 US claimed
WO-2002100478-A9 ACCELERATORS FOR INCREASING THE RATE OF FORMATION OF FREE RADICALS AND REACTIVE OXYGEN SPECIES CAVALIER DISCOVERY (US) 2003-03-27 WO claimed
WO-2002100478-A2 ACCELERATORS FOR INCREASING THE RATE OF FORMATION OF FREE RADICALS AND REACTIVE OXYGEN SPECIES CAVALIER DISCOVERY (US) 2002-12-19 WO claimed
US-6433061-B1 CROSSLINKED COPOLYMER OF UNSATURATED CARBOXYLIC ACID, HYDROPHOBIC MONOMER, AND CHAIN TRANSFER AGENT; INCREASES VISCOSITY IN SALT-CONTAINING SYSTEMS; FOR USE IN SHAMPOOS, CLEANERS, AND DRUG DELIVERY SYSTEMS NOVEON IP HOLDINGS CORP. 2002-08-13 US claimed
WO-2002034793-A2 RHEOLOGY MODIFYING COPOLYMER COMPOSITION NOVEON IP HOLDINGS CORP. (US) 2002-05-02 WO claimed
US-5290911-A Forming polymers by catalytic oxidative coupling RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) 1994-03-01 US claimed