Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | MMP1 | P03956 | 2/20 | 0.34 |
| ▸ | MMP2 | P08253 | 2/20 | 0.34 |
| ▸ | MMP9 | P14780 | 2/20 | 0.34 |
| ▸ | MMP8 | P22894 | 2/20 | 0.34 |
| ▸ | MMP13 | P45452 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6315098 | 0.85 | CA2 (0.43) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL7261139 | 0.83 | CA2 (0.47) | CA2CA1MMP1MMP2MMP9 | |
| Potassium Ion SCHEMBL2497074 | 0.81 | CA2 (0.42) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2499934 | 0.81 | CA2 (0.44) | CA2CA1MMP1MMP2MMP9 | |
| Trifluoromethanesulfonic Acid SCHEMBL1785286 | 0.79 | GPR3 (0.34) | CA2CA1 | |
| Potassium Ion SCHEMBL2500518 | 0.79 | CA2 (0.44) | CA2CA1MMP1MMP2MMP9 | |
| Lithium Ion SCHEMBL5014766 | 0.73 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| Potassium Ion SCHEMBL2499164 | 0.73 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL28609074 | 0.71 | CA2 (0.40) | CA2CA1MMP1MMP2MMP9 | |
| Perflubutane SCHEMBL7865493 | 0.67 | CA2 (0.48) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2009019574-A1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-02-12 | — | — | WO | disclosed |
| US-20090042148-A1 | Photoresist Composition for Deep UV and Process Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-12 | — | — | US | disclosed |