SCHEMBL394398

SCHEMBL394398

NCCNCCOCCO

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.48
CA6 P23280 5/20 0.48
CA7 P43166 5/20 0.48
CA9 Q16790 5/20 0.48
CA14 Q9ULX7 5/20 0.48
CA5B Q9Y2D0 5/20 0.48
MEN1 O00255 4/20 0.48
KMT2A Q03164 4/20 0.48
TSHR P16473 3/20 0.48
RECQL P46063 2/20 0.48
MAPK1 P28482 1/20 0.48
CA2 P00918 4/20 0.46
CA4 P22748 4/20 0.46
CA5A P35218 4/20 0.46
CA3 P07451 3/20 0.46
ALOX15 P16050 3/20 0.46
ALDH1A1 P00352 3/20 0.46
LMNA P02545 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
CA1 P00915 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9501060 0.98 MEN1 (0.50) CA12CA6CA7CA9CA14
SCHEMBL24040362 0.98 MEN1 (0.50) CA12CA6CA7CA9CA14
SCHEMBL6130682 0.96 CA12 (0.48) CA12CA6CA7CA9CA14
SCHEMBL10455983 0.91 CA12 (0.50) CA12CA6CA7CA9CA14
SCHEMBL10151431 0.88 MEN1 (0.50) CA12CA6CA7CA9CA14
SCHEMBL19189861 0.88 MEN1 (0.50) CA12CA6CA7CA9CA14
SCHEMBL8015113 0.87 CA12 (0.62) CA12CA6CA7CA9CA14
SCHEMBL720627 0.87 TSHR (0.62) MEN1KMT2ATSHRRECQLMAPK1
SCHEMBL9017688 0.86 CA12 (0.43) CA12CA6CA7CA9CA14
Norspermidine SCHEMBL20657112 0.86 CA12 (0.55) CA12CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 234 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11377624-B2 Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process BASF SE (DE) 2022-07-05 US claimed
US-20210301221-A1 CLEANING COMPOSITION FOR POST-ETCH OR POST ASH RESIDUE REMOVAL FROM A SEMICONDUCTOR SUBSTRATE AND CORRESPONDING MANUFACTURING PROCESS BASF SE (DE) 2021-09-30 US claimed
CN-113416525-A Environment-friendly polyether tertiary amine as shale surface hydration inhibitor 西南石油大学 2021-09-21 CN claimed
EP-3720938-A1 CLEANING COMPOSITION FOR POST-ETCH OR POST ASH RESIDUE REMOVAL FROM A SEMICONDUCTOR SUBSTRATE AND CORRESPONDING MANUFACTURING PROCESS BASF SE (DE) 2020-10-14 EP claimed
CN-111465679-A Cleaning compositions for removing post-etch or post-ash residues from semiconductor substrates and corresponding methods 巴斯夫欧洲公司 2020-07-28 CN claimed
WO-2019110681-A1 CLEANING COMPOSITION FOR POST-ETCH OR POST ASH RESIDUE REMOVAL FROM A SEMICONDUCTOR SUBSTRATE AND CORRESPONDING MANUFACTURING PROCESS BASF SE (DE) 2019-06-13 WO claimed
US-8003587-B2 Semiconductor process residue removal composition and process EKC TECHNOLOGY, INC. (US) 2011-08-23 US claimed
EP-2222421-A1 PRINTER HEAD AND PRINTER DISK CLEANING COMPOSITIONS AND METHODS OF USE EKC TECHNOLOGY, INC. (US) 2010-09-01 EP claimed
US-20090203566-A1 Semi Conductor Process Residue Removal Composition and Process EKC TECHNOLOGY, INC. 2009-08-13 US claimed
WO-2009070190-A1 PRINTER HEAD AND PRINTER DISK CLEANING COMPOSITIONS AND METHODS OF USE EKC TECHNOLOGY, INC. (US) 2009-06-04 WO claimed
US-20090137439-A1 Printer Head and Printer Disk Cleaning Compositions and Methods of Use EKC TECHNOLOGY, INC. 2009-05-28 US claimed
US-20050107467-A1 Methods for producing and using a Cu(I)-based wood preservative OSMOSE, INC 2005-05-19 US claimed
WO-2005037507-A1 METHODS FOR PRODUCING AND USING A CU(1)-BASED WOOD PRESERVATIVE PHIBRO-TECH, INC. (US) 2005-04-28 WO claimed
WO-2025118149-A1 PHOTORESIST STRIPPING COMPOSITIONS FOR ELECTRONIC APPLICATIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2025-06-12 WO disclosed
US-12242198-B2 Photoresist stripping composition DOW GLOBAL TECHNOLOGIES LLC (US) 2025-03-04 US disclosed
US-20230248837-A1 Technology for Modulating Targeting Chimeras Induced by Cell-Penetrating Peptide and Application Thereof LIU, MIAO (CN) 2023-08-10 US disclosed
US-4368133-A Aqueous systems containing nitrogen-containing, phosphorous-free carboxylic solubilizer/surfactant additives THE LUBRIZOL CORPORATION (US) 1983-01-11 US disclosed
US-4234435-A Novel carboxylic acid acylating agents, derivatives thereof, concentrate and lubricant compositions containing the same, and processes for their preparation THE LUBRIZOL CORPORATION (US) 1980-11-18 US disclosed
US-4152276-A AMIDATION, ESTERIFICATION, IMIDATION, CARBOXYLATION ETHYL CORPORATION (US) 1979-05-01 US disclosed
US-4145434-A TETRACYCLIC DERIVATIVES AND PHARMACEUTICAL COMPOSITIONS OF MATTER AKZONA INCORPORATED (US) 1979-03-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12242198-B2 Photoresist stripping composition PAH, ALKBH2, PNMT CA12 1542/4885CA6 2825/4885CA7 658/4885
US-20230248837-A1 Technology for Modulating Targeting Chimeras Induced by Cell-Penetrating Peptide and Application Thereof VIP, GHITM, MYCBP CA12 2958/4885CA6 3194/4885CA7 3785/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.