SCHEMBL394823

SCHEMBL394823

NCCOCCNCCO

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.40
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 2/20 0.37
CA12 O43570 3/20 0.35
CA6 P23280 3/20 0.35
CA7 P43166 3/20 0.35
CA9 Q16790 3/20 0.35
CA14 Q9ULX7 3/20 0.35
CA5B Q9Y2D0 3/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
MAPK1 P28482 1/20 0.35
RECQL P46063 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.34
CYP1A2 P05177 1/20 0.34
POLB P06746 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C19 P33261 1/20 0.34
LMNA P02545 2/20 0.33
TDP1 Q9NUW8 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14980618 0.98 TSHR (0.42) TSHRALDH1A1KDM4ECA12CA6
Diethanolamine SCHEMBL10897038 0.91 TSHR (0.48) TSHRALDH1A1KDM4ECA12CA6
SCHEMBL10151431 0.88 MEN1 (0.50) TSHRALDH1A1KDM4ECA12CA6
SCHEMBL19189861 0.88 MEN1 (0.50) TSHRALDH1A1KDM4ECA12CA6
SCHEMBL770197 0.87 CA12 (0.44) TSHRALDH1A1KDM4ECA12CA6
SCHEMBL8373285 0.87 TSHR (0.46) TSHRALDH1A1KDM4EMEN1KMT2A
SCHEMBL9017688 0.86 CA12 (0.43) TSHRALDH1A1KDM4ECA12CA6
SCHEMBL7262297 0.85 CA12 (0.42) TSHRALDH1A1KDM4ECA12CA6
SCHEMBL11806304 0.85 TSHR (0.49) TSHRALDH1A1KDM4EMEN1KMT2A
SCHEMBL10381823 0.85 TSHR (0.49) TSHRALDH1A1KDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11377624-B2 Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process BASF SE (DE) 2022-07-05 US claimed
US-20210301221-A1 CLEANING COMPOSITION FOR POST-ETCH OR POST ASH RESIDUE REMOVAL FROM A SEMICONDUCTOR SUBSTRATE AND CORRESPONDING MANUFACTURING PROCESS BASF SE (DE) 2021-09-30 US claimed
CN-113416525-A Environment-friendly polyether tertiary amine as shale surface hydration inhibitor 西南石油大学 2021-09-21 CN claimed
EP-3720938-A1 CLEANING COMPOSITION FOR POST-ETCH OR POST ASH RESIDUE REMOVAL FROM A SEMICONDUCTOR SUBSTRATE AND CORRESPONDING MANUFACTURING PROCESS BASF SE (DE) 2020-10-14 EP claimed
CN-111465679-A Cleaning compositions for removing post-etch or post-ash residues from semiconductor substrates and corresponding methods 巴斯夫欧洲公司 2020-07-28 CN claimed
WO-2019110681-A1 CLEANING COMPOSITION FOR POST-ETCH OR POST ASH RESIDUE REMOVAL FROM A SEMICONDUCTOR SUBSTRATE AND CORRESPONDING MANUFACTURING PROCESS BASF SE (DE) 2019-06-13 WO claimed
US-8003587-B2 Semiconductor process residue removal composition and process EKC TECHNOLOGY, INC. (US) 2011-08-23 US claimed
CN-101873898-A Printer head and printer disk cleaning compositions and methods of use thereof EKC TECHNOLOGY INC 2010-10-27 CN claimed
EP-2222421-A1 PRINTER HEAD AND PRINTER DISK CLEANING COMPOSITIONS AND METHODS OF USE EKC TECHNOLOGY, INC. (US) 2010-09-01 EP claimed
US-20090203566-A1 Semi Conductor Process Residue Removal Composition and Process EKC TECHNOLOGY, INC. 2009-08-13 US claimed
WO-2009070190-A1 PRINTER HEAD AND PRINTER DISK CLEANING COMPOSITIONS AND METHODS OF USE EKC TECHNOLOGY, INC. (US) 2009-06-04 WO claimed
US-20090137439-A1 Printer Head and Printer Disk Cleaning Compositions and Methods of Use EKC TECHNOLOGY, INC. 2009-05-28 US claimed
US-20050107467-A1 Methods for producing and using a Cu(I)-based wood preservative OSMOSE, INC 2005-05-19 US claimed
WO-2005037507-A1 METHODS FOR PRODUCING AND USING A CU(1)-BASED WOOD PRESERVATIVE PHIBRO-TECH, INC. (US) 2005-04-28 WO claimed
WO-2025118149-A1 PHOTORESIST STRIPPING COMPOSITIONS FOR ELECTRONIC APPLICATIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2025-06-12 WO disclosed
US-12242198-B2 Photoresist stripping composition DOW GLOBAL TECHNOLOGIES LLC (US) 2025-03-04 US disclosed
CN-119095662-A Amine composition for separating carbon dioxide 东曹株式会社 2024-12-06 CN disclosed
US-20030138432-A1 Selective cellular targeting: multifunctional delivery vehicles, multifunctional prodrugs, use as antineoplastic drugs DRUG INNOVATION & DESIGN, INC. 2003-07-24 US disclosed
EP-1255567-A1 SELECTIVE CELLULAR TARGETING: MULTIFUNCTIONAL DELIVERY VEHICLES Drug Innovation & Design, Inc. (US) 2002-11-13 EP disclosed
WO-2001036003-A2 SELECTIVE CELLULAR TARGETING: MULTIFUNCTIONAL DELIVERY VEHICLES DRUG INNOVATION & DESIGN, INC. (US) 2001-05-25 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12242198-B2 Photoresist stripping composition PAH, ALKBH2, PNMT TSHR 3353/4885ALDH1A1 654/4885KDM4E 1291/4885
US-20030138432-A1 Selective cellular targeting: multifunctional delivery vehicles, multifunctional prodrugs, use as antineoplastic drugs PAICS, ABCB1, ABCG2 TSHR 3173/4885ALDH1A1 589/4885KDM4E 1551/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.