SCHEMBL3949037

SCHEMBL3949037

C[Si](C)(C)Cc1ccccc1C[Si](C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.40
TAAR1 Q96RJ0 6/20 0.33
HSPA5 P11021 1/20 0.33
GABRA1 P14867 2/20 0.32
GABRB2 P47870 2/20 0.32
MAPT P10636 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
PNMT P11086 1/20 0.31
IDO1 P14902 1/20 0.31
ABCG2 Q9UNQ0 1/20 0.30
TP53 P04637 1/20 0.30
PKM P14618 1/20 0.30
CYP2A13 Q16696 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7021854 0.87 PNMT (0.44) ESR1TAAR1PNMT
SCHEMBL8757020 0.82 CYP3A4 (0.41) ESR1
SCHEMBL7330924 0.82 TAAR1 (0.48) TAAR1IDO1CYP2A13
SCHEMBL8443556 0.82 ESR1 (0.33) ESR1IDO1TP53
SCHEMBL14011912 0.82 HSPA5 (0.54) ESR1TAAR1HSPA5MAPTIDO1
Iodide SCHEMBL16968727 0.82 CHRM2 (0.50) ESR1MAPTCYP2D6
SCHEMBL5302388 0.80 SLC6A4 (0.43)
SCHEMBL28362173 0.80 HSPA5 (0.52) ESR1TAAR1HSPA5MAPTIDO1
SCHEMBL6904621 0.78 ALDH1A1 (0.42) MAPTTP53CYP2D6
SCHEMBL9030704 0.77 LMNA (0.48) CYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US claimed
US-20080199977-A1 Activated Chemical Process for Enhancing Material Properties of Dielectric Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-08-21 US claimed
EP-1959485-A2 Activated chemical process for enhancing material properties of dielectric films Air Products and Chemicals, Inc. (US) 2008-08-20 EP claimed