⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8855929 | 1.00 | — | — | |
| SCHEMBL8855937 | 1.00 | — | — | |
| SCHEMBL13669944 | 0.83 | THRB (0.50) | — | |
| SCHEMBL26509369 | 0.83 | THRB (0.50) | — | |
| SCHEMBL1491969 | 0.83 | THRB (0.50) | — | |
| SCHEMBL15895084 | 0.82 | LMNA (0.37) | — | |
| SCHEMBL15044040 | 0.82 | LMNA (0.37) | — | |
| SCHEMBL3630693 | 0.82 | PTPN1 (0.39) | — | |
| SCHEMBL18136267 | 0.82 | LMNA (0.37) | — | |
| SCHEMBL14556007 | 0.82 | LMNA (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 716 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4624554-A1 | FABRIC CARE COMPOSITIONS | The Procter & Gamble Company (US) | 2025-10-01 | — | — | EP | claimed |
| EP-4621488-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2025-09-24 | — | — | EP | claimed |
| US-20250236813-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | YCCHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | claimed |
| CN-120019333-A | Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same | YC化学制品株式会社 | 2025-05-16 | — | — | CN | claimed |
| WO-2024106711-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | 와이씨켐 주식회사 | 2024-05-23 | — | — | WO | claimed |
| US-20230266672-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-08-24 | — | — | US | claimed |
| EP-4212958-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2023-07-19 | — | — | EP | claimed |
| CN-116097398-A | Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same | 荣昌化学制品株式会社 | 2023-05-09 | — | — | CN | claimed |
| US-20220342313-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2022-10-27 | — | — | US | claimed |
| EP-4036648-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2022-08-03 | — | — | EP | claimed |
| EP-2116224-B1 | COSMETIC COMPOSITION | JNC CORP (JP) | 2016-01-27 | — | — | EP | claimed |
| EP-2889335-A1 | AQUEOUS LIQUID COMPOSITION, AQUEOUS COATING LIQUID, FUNTIONAL COATING FILM AND COMPOSITE MATERIAL | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2015-07-01 | — | — | EP | claimed |
| US-20150179357-A1 | AQUEOUS LIQUID COMPOSITION, AQUEOUS COATING LIQUID, FUNCTIONAL COATING FILM AND COMPOSITE MATERIAL | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2015-06-25 | — | — | US | claimed |
| CN-104610222-A | Process for preparing episulfide compounds | ASAHI KASEI CHEMICALS CORP | 2015-05-13 | — | — | CN | claimed |
| CN-104583333-A | Aqueous liquid composition, aqueous coating liquid, functional coating film and composite material | DAINICHISEIKA COLOR CHEM | 2015-04-29 | — | — | CN | claimed |
| US-20100055060-A1 | COSMETIC COMPOSITION | JNC CORPORATION (JP) | 2010-03-04 | — | — | US | claimed |
| EP-2116224-A1 | COSMETIC COMPOSITION | Chisso Corporation (JP) | 2009-11-11 | — | — | EP | claimed |
| EP-1604647-B1 | Cosmetic composition containing polyorganosiloxane-containing epsilon-polylysine polymer, and polyhydric alcohol, and production thereof | CHISSO CORP (JP) | 2008-05-07 | — | — | EP | claimed |
| US-20060018867-A1 | Cosmetic composition and production thereof | ICHIMARU PHARCOS CO., LTD | 2006-01-26 | — | — | US | claimed |
| EP-1604647-A1 | Cosmetic composition containing polyorganosiloxane-containing epsilon-polylysine polymer, and polyhydric alcohol, and production thereof | Ichimaru Pharcos Co., Ltd. (JP) | 2005-12-14 | — | — | EP | claimed |