SCHEMBL3952172

SCHEMBL3952172

CC(C)(C)c1cc(CCCNCCCCCCNCCCc2cc(C(C)(C)C)c(O)c(C(C)(C)C)c2)cc(C(C)(C)C)c1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.58
GSR P00390 2/20 0.54
KMT2A Q03164 3/20 0.50
ALDH1A1 P00352 6/20 0.47
TSHR P16473 3/20 0.47
MAPK1 P28482 3/20 0.47
MEN1 O00255 2/20 0.47
CYP1A2 P05177 2/20 0.47
CYP3A4 P08684 2/20 0.47
BLM P54132 2/20 0.47
ATM Q13315 2/20 0.47
HIF1A Q16665 2/20 0.47
NPSR1 Q6W5P4 2/20 0.47
MAPT P10636 2/20 0.47
USP2 O75604 1/20 0.47
CYP2D6 P10635 1/20 0.47
LMNA P02545 2/20 0.47
SCN2A Q99250 2/20 0.47
GMNN O75496 1/20 0.46
GABBR2 O75899 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9179928 1.00 GAA (0.58) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL9184605 0.95 GAA (0.60) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL9185437 0.93 GSR (0.54) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL9185815 0.91 GSR (0.56) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL9183204 0.87 GAA (0.52) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL20033529 0.86 GAA (0.70) GAAKMT2AALDH1A1MEN1LMNA
SCHEMBL9179922 0.86 GSR (0.73) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL1355342 0.86 GAA (0.61) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL9182795 0.85 GSR (0.61) GAAGSRKMT2AALDH1A1TSHR
SCHEMBL18193749 0.85 ALDH1A1 (0.57) GAAGSRKMT2AALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1099982-B1 STABLE PHOTOSENSITIVE RESIN COMPOSITION ASAHI KASEI CHEMICALS CORP (JP) 2009-04-29 EP disclosed
US-6383716-B1 RESIN WITH BIS(3,5-DI-T-BUTYL-4-HYDROXY-BENZYL) SULFIDE. THE PHOTOSENSITIVE RESIN COMPOSITION OF THIS INVENTION, AS IT CONTAINS A STABILIZER ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-05-07 US disclosed
EP-1099982-A1 STABLE PHOTOSENSITIVE RESIN COMPOSITION Asahi Kasei Kabushiki Kaisha (JP) 2001-05-16 EP disclosed
US-5844026-A N,N',N''-tris{2,4-bis Hydrocarbyloxy-2,2,6,6-tetra-methylpiperidin-4-yl)alkylamino!-s-triazin-6-yl}-3,3'-ethylenediiminodipropylamines, their isomers and bridged derivatives and polymer compositions stabilized therewith CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-12-01 US disclosed