Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
| ▸ | CETP | P11597 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL1047242 | 1.00 | DNM1 (0.46) | DNM1MEN1KMT2AEPHX2TP53 | |
| Water SCHEMBL9244223 | 0.96 | DNM1 (0.43) | DNM1MEN1KMT2AEPHX2TP53 | |
| Hydrochloric Acid SCHEMBL392156 | 0.96 | MEN1 (0.46) | DNM1MEN1KMT2AEPHX2TP53 | |
| Hydrochloric Acid SCHEMBL9347559 | 0.96 | MEN1 (0.46) | DNM1MEN1KMT2AEPHX2TP53 | |
| Iodide SCHEMBL1046043 | 0.96 | DNM1 (0.43) | DNM1MEN1KMT2AEPHX2TP53 | |
| Hydrochloric Acid SCHEMBL30275005 | 0.96 | MEN1 (0.46) | DNM1MEN1KMT2AEPHX2TP53 | |
| Hydrochloric Acid SCHEMBL395850 | 0.96 | MEN1 (0.46) | DNM1MEN1KMT2AEPHX2TP53 | |
| Sulfuric Acid SCHEMBL11746943 | 0.89 | CETP (0.41) | MEN1KMT2AEPHX2PKMSIGMAR1 | |
| Sulfuric Acid SCHEMBL11746939 | 0.89 | EPHX2 (0.41) | DNM1MEN1KMT2AEPHX2TP53 | |
| SCHEMBL6305354 | 0.83 | HPGD (0.38) | DNM1EPHX2MAPK1PKMKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | claimed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | claimed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | claimed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | claimed |
| US-8530617-B2 | Silicon-containing particle, process for producing the same, organic-polymer composition, ceramic, and process for producing the same | DOW CORNING TORAY COMPANY, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8450231-B2 | Silicon-containing particles, method for manufacturing thereof, oil composition, ceramic material, and method for manufacturing thereof | DOW CORNING TORAY COMPANY, LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| EP-2461397-A1 | ELECTRODE ACTIVE MATERIAL, ELECTRODE, AND ELECTRICITY STORAGE DEVICE | Dow Corning Toray Co., Ltd. (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-20120121981-A1 | Electrode Active Material, Electrode, And Electricity Storage Device | DOW CORNING TORAY CO., LTD. (JP) | 2012-05-17 | — | — | US | disclosed |
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-20110045963-A1 | Silicon-Containing Particles, Method For Manufacturing Thereof, Oil Composition, Ceramic Material, And Method For Manufacturing Thereof | DOW CORNING TORAY COMPANY, LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110033708-A1 | Silicon-Containing Particle, Process For Producing The Same, Organic-Polymer Composition, Ceramic, And Process For Producing The Same | DOW CORNING TORAY COMPANY, LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| EP-2271702-A2 | SILICON-CONTAINING PARTICLES, METHOD FOR MANUFACTURING THEREOF, OIL COMPOSITION, CERAMIC MATERIAL, AND METHOD FOR MANUFACTURING THEREOF | Dow Corning Toray Co., Ltd. (JP) | 2011-01-12 | — | — | EP | disclosed |
| EP-2241586-A1 | SILICON-CONTAINING PARTICLE, PROCESS FOR PRODUCING THE SAME, ORGANIC-POLYMER COMPOSITION, CERAMIC, AND PROCESS FOR PRODUCING THE SAME | Dow Corning Toray Co., Ltd. (JP) | 2010-10-20 | — | — | EP | disclosed |
| WO-2009133765-A2 | SILICON-CONTAINING PARTICLES, METHOD FOR MANUFACTURING THEREOF, OIL COMPOSITION, CERAMIC MATERIAL, AND METHOD FOR MANUFACTURING THEREOF | DOW CORNING TORAY CO., LTD. (JP) | 2009-11-05 | — | — | WO | disclosed |
| US-4210552-A | EVEN IN PRESENCE OF FERRIC IONS | THE DOW CHEMICAL COMPANY (US) | 1980-07-01 | — | — | US | disclosed |
| US-RE30283-E | Sulfonium compounds as corrosion inhibitors in aqueous acidic cleaning solutions | THE DOW CHEMICAL COMPANY (US) | 1980-05-27 | — | — | US | disclosed |
| US-4101438-A | Sulfonium compounds as corrosion inhibitors in aqueous acidic cleaning solutions | THE DOW CHEMICAL COMPANY (US) | 1978-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110033708-A1 | Silicon-Containing Particle, Process For Producing The Same, Organic-Polymer Composition, Ceramic, And Process For Producing The Same | SKP1, SPOP, SSRP1 | DNM1 4636/4885MEN1 640/4885KMT2A 1122/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.