Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 2/20 | 0.45 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
| ▸ | CETP | P11597 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL30275005 | 1.00 | MEN1 (0.46) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL9347559 | 1.00 | MEN1 (0.46) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL392156 | 1.00 | MEN1 (0.46) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Bromide SCHEMBL1047242 | 0.96 | DNM1 (0.46) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Bromide SCHEMBL395786 | 0.96 | DNM1 (0.46) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Iodide SCHEMBL1046043 | 0.96 | DNM1 (0.43) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Water SCHEMBL9244223 | 0.96 | DNM1 (0.43) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Sulfuric Acid SCHEMBL11746943 | 0.89 | CETP (0.41) | MEN1KMT2AEPHX2PKMSIGMAR1 | |
| Sulfuric Acid SCHEMBL11746939 | 0.89 | EPHX2 (0.41) | MEN1KMT2ATP53MAPK1SMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL394410 | 0.84 | TP53 (0.42) | MEN1KMT2ATP53MAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | claimed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | claimed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | claimed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | claimed |
| CN-115974741-A | Sulfonium salt-based cationic compound and antibacterial application | 黑龙江八一农垦大学 | 2023-04-18 | — | — | CN | disclosed |
| US-8173584-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-05-08 | — | — | US | disclosed |
| US-20120083436-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | LASERWORT LTD (HK) | 2012-04-05 | — | — | US | disclosed |
| US-8101561-B2 | Composition and method for treating semiconductor substrate surface | LASERWORT LTD (HK) | 2012-01-24 | — | — | US | disclosed |
| US-20110118165-A1 | COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE | Lee, Wai Mun (US) | 2011-05-19 | — | — | US | disclosed |
| US-3996147-A | Novel sulfonium corrosion inhibitors in aqueous acid solutions | THE DOW CHEMICAL COMPANY (US) | 1976-12-07 | — | — | US | disclosed |