SCHEMBL3963482

SCHEMBL3963482

CCCCOC(C)OC(C)O[Si](OC(C)OC(C)OCCCC)(OC(C)OC(C)OCCCC)OC(C)OC(C)OCCCC

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 1/20 0.31
ADRB2 P07550 1/20 0.31
ADRB1 P08588 1/20 0.31
ADRB3 P13945 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8373591 0.89 ADRB2 (0.35) DNM1ADRB2ADRB1ADRB3
SCHEMBL6122979 0.87 ADRB2 (0.39) DNM1ADRB2ADRB1ADRB3
SCHEMBL10353370 0.84 ADRB2 (0.38) DNM1ADRB2ADRB1ADRB3
SCHEMBL9137918 0.84 ADRB2 (0.38) DNM1ADRB2ADRB1ADRB3
SCHEMBL5843129 0.80 ADRB2 (0.35) DNM1ADRB2ADRB1ADRB3
SCHEMBL2962635 0.80 ADRB2 (0.35) DNM1ADRB2ADRB1ADRB3
SCHEMBL250770 0.80 DNM1 (0.46) DNM1
SCHEMBL7110599 0.79 DNM1 (0.31) DNM1ADRB2ADRB1ADRB3
SCHEMBL7111653 0.79 DNM1 (0.31) DNM1ADRB2ADRB1ADRB3
Ethylene Glycol SCHEMBL18334320 0.78 TSHR (0.44) DNM1ADRB2ADRB1ADRB3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2002520813-A 2002-07-09 JP claimed
EP-1097472-A1 VAPOR DEPOSITION ROUTES TO NANOPOROUS SILICA AlliedSignal Inc. (US) 2001-05-09 EP claimed
US-6022812-A DIELECTRIC POLYSILICATE FILMS BY VAPOR DEPOSITION OF TETRA-ALKOXYSILANE(S) ON A SUBSTRATE; EXPOSING TO WATER AND ACID OR BASE CATALYST TO GEL; DRYING; HIGH POROSITY; LOW DIELECTRIC CONSTANT; SEMICONDUCTORS; INTEGRATED CIRCUITS ALLIEDSIGNAL INC. (US) 2000-02-08 US claimed
WO-2000002241-A1 VAPOR DEPOSITION ROUTES TO NANOPOROUS SILICA ALLIEDSIGNAL INC. (US) 2000-01-13 WO claimed
EP-2749608-B1 Anti-reflection coatings with self-cleaning properties, substrates including such coatings, and related methods GUARDIAN INDUSTRIES (US) 2016-09-21 EP disclosed
US-20140186613-A1 ANTI-REFLECTION COATINGS WITH SELF-CLEANING PROPERTIES, SUBSTRATES INCLUDING SUCH COATINGS, AND RELATED METHODS GUARDIAN INDUSTRIES CORP. (US) 2014-07-03 US disclosed
EP-2749608-A1 Anti-reflection coatings with self-cleaning properties, substrates including such coatings, and related methods GUARDIAN INDUSTRIES CORP. (US) 2014-07-02 EP disclosed
US-7530683-B2 Fixing fluid and inkjet ink sets comprising same E.I. DU PONT DE NEMOURS AND COMPANY (US) 2009-05-12 US disclosed
EP-1778799-B1 FIXING FLUID AND INKJET INK SETS COMPRISING SAME DU PONT (US) 2009-03-04 EP disclosed
WO-2008147789-A2 TRANSPARENT CONDUCTIVE MATERIALS AND COATINGS, METHODS OF PRODUCTION AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2008-12-04 WO disclosed
US-20080292979-A1 TRANSPARENT CONDUCTIVE MATERIALS AND COATINGS, METHODS OF PRODUCTION AND USES THEREOF HONEYWELL INTERNATIONAL, INC. 2008-11-27 US disclosed
US-7445953-B2 Low temperature curable materials for optical applications HONEYWELL INTERNATIONAL INC. (US) 2008-11-04 US disclosed
WO-2001086709-A2 SIMPLIFIED METHOD TO PRODUCE NANOPOROUS SILICON-BASED FILMS HONEYWELL INTERNATIONAL INC. (US) 2001-11-15 WO disclosed
US-20010036749-A1 Apparatus and methods for integrated circuit planarization LEVERT JOSEPH A (US) 2001-11-01 US disclosed
WO-2001032789-A1 CURABLE INKJET PRINTABLE INK COMPOSITIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-05-10 WO disclosed
EP-1097472-A1 VAPOR DEPOSITION ROUTES TO NANOPOROUS SILICA AlliedSignal Inc. (US) 2001-05-09 EP disclosed
WO-2001018860-A2 IMPROVED APPARATUS AND METHODS FOR INTEGRATED CIRCUIT PLANARIZATION ALLIEDSIGNAL INC. (US) 2001-03-15 WO disclosed
WO-2001015214-A1 NANOPOROUS SILICA TREATED WITH SILOXANE POLYMERS FOR ULSI APPLICATIONS ALLIEDSIGNAL INC. (US) 2001-03-01 WO disclosed
US-6022812-A DIELECTRIC POLYSILICATE FILMS BY VAPOR DEPOSITION OF TETRA-ALKOXYSILANE(S) ON A SUBSTRATE; EXPOSING TO WATER AND ACID OR BASE CATALYST TO GEL; DRYING; HIGH POROSITY; LOW DIELECTRIC CONSTANT; SEMICONDUCTORS; INTEGRATED CIRCUITS ALLIEDSIGNAL INC. (US) 2000-02-08 US disclosed
WO-2000002241-A1 VAPOR DEPOSITION ROUTES TO NANOPOROUS SILICA ALLIEDSIGNAL INC. (US) 2000-01-13 WO disclosed