Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3970056 | 0.99 | HTT (0.31) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL3975128 | 0.91 | MEN1 (0.32) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL3973479 | 0.90 | ALDH1A1 (0.35) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL3965828 | 0.90 | MEN1 (0.31) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL3119750 | 0.90 | TSHR (0.42) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL3973420 | 0.89 | HTT (0.34) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL704518 | 0.89 | TSHR (0.41) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL2521576 | 0.89 | HTT (0.32) | HTTMCOLN3ALDH1A1LMNATSHR | |
| SCHEMBL702252 | 0.89 | ALDH1A1 (0.36) | HTTALDH1A1LMNATSHR | |
| SCHEMBL701333 | 0.88 | KMT2A (0.41) | HTTMCOLN3ALDH1A1LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7531286-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7510817-B2 | Photoresist polymer compositions | JSR CORPORATION (JP) | 2009-03-31 | — | — | US | disclosed |
| EP-1641848-B1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORP (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-20060257781-A1 | Photoacid generator, and a polymer with units of 2-alkyladamantyl (meth)acrylate, 3-hydroxyadamantyl (meth)acrylate, 1-alkylcyclopentyl (meth)acrylate or 7-oxo-3,8-methano-6-oxabicyclo(3.2.1)octan-4-yl (meth)acrylate, made with a chain transfer agent; e.g. RAFT polymer; narrow polydispersity | FREESLATE, INC. | 2006-11-16 | — | — | US | disclosed |
| US-7105269-B2 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-12 | — | — | US | disclosed |
| EP-1641849-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | Symyx Technologies, Inc. (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005000923-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-06 | — | — | WO | disclosed |
| US-20030203309-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |